Characterization of cross sectional profile of nanostructure line grating using small angle x-ray scattering

Ishibashi, Yoriyuki; Koike, Tatsuhiko; Yamazaki, Yuichiro; Ito, Yoshiyasu; Okazaki, Yuko; Omote, Kazuhiko

doi:10.1117/12.848193

Cited by 10 publications

(7 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In this experimental evaluation, grazing-incidence smallangle x-ray scattering (GI-SAXS) was selected as the inline reference metrology tool 5 and scatterometry was selected as the inline metrology tool. Figure 4 shows a schematic diagram of GI-SAXS.…”

Section: Experimental Results Of Vms By Using Gi-saxsmentioning

confidence: 99%

Verification metrology system by using inline reference metrology

Abe

Ishibashi

Ida

et al. 2014

J. Micro/Nanolith. MEMS MOEMS

View full text Add to dashboard Cite

Abstract. For robustness improvement of inline metrology tools, we propose an inline reference metrology system, named verification metrology system (VMS). This system combines inline metrology and nondestructive reference metrology tools. VMS can detect the false alarm error and the nondetectable error caused by measurement robustness decay of inline metrology tools. Grazing-incidence small-angle x-ray scattering (GI-SAXS) was selected as the inline reference metrology tool. GI-SAXS has high robustness capability for under-layer structural changes. VMS with scatterometry and GI-SAXS was evaluated for measurement robustness. The potential to detect metrology system errors was confirmed using VMS. Cost reduction effect of VMS was estimated for the false alarm case. Total cost is obtained as a sum of the false alarm losses and the metrology costs. VMS is effective for total cost reduction with low sampling. Also, it is important that the sampling frequency of reference metrology is optimized based on process qualities.

show abstract

Section: Experimental Results Of Vms By Using Gi-saxsmentioning

confidence: 99%

Verification metrology system by using inline reference metrology

Abe

Ishibashi

Ida

et al. 2014

J. Micro/Nanolith. MEMS MOEMS

View full text Add to dashboard Cite

show abstract

“…In order to go around x-ray absorption limitations, several teams performed measurements at synchrotron in grazing incidence configuration [8][9][10][11]. While the formalism is a bit more complex with multi-reflection e vents, t he p ossibility o f u sing l ower e nergy x -ray s ources l ead t o t he first measurements tests with a Cu-Kα x-ray source [12]. The approach was also extended to even lower energy sources in synchrotron to study the latent image in EUV resist with resonant x-ray measurements [13].…”

Section: Introductionmentioning

confidence: 99%

Reconstruction of the in-depth profile of line gratings with critical dimension grazing incidence small angle x-ray scattering on a laboratory equipment

Freychet

Rademaker

Blancquaert

et al. 2023

Metrology, Inspection, and Process Control XXXVII

View full text Add to dashboard Cite

We present a reconstruction of the in-depth profile of line gratings using critical-dimension grazing incidence small angle x-ray scattering with a compact Cu-Kα x-ray source mounted on a laboratory SAXS. By taking advantage of the grazing-incidence configuration and with a rotation of the gratings under the x-ray beam, several orders of the Bragg rods were probed and lead to the extraction of the in-depth profile of the lines. The extracted in-depth profile is compared with 3D-AFM results. The methodology developed mimics the one of CD-SAXS measurements, in transmission, in order to enable future comparison between the two approaches as well as building complementary modeling. These results open new perspectives for x-ray metrology at the fab since the Cu-Kα x-ray source is the most developed, spread and used source by the x-ray community.

show abstract

“…[8][9][10][11] While the formalism is a bit more complex with multi-reflection events, the possibility of using lower energy x-ray sources lead to the first measurements tests with a Cu-Kα x-ray source. 12,13 The approach was also extended to even lower-energy sources in synchrotron to study the latent image in extreme ultraviolet (EUV) resist with resonant x-ray measurements. 14 In this paper, we report the reconstruction of the in-depth profile of lines using laboratory small angle x-ray scattering (SAXS) with a Cu-Kα x-ray source.…”

Section: Introductionmentioning

confidence: 99%

“…To go around x-ray absorption limitations, several measurements were performed at synchrotron in grazing incidence configuration 8 – 11 While the formalism is a bit more complex with multi-reflection events, the possibility of using lower energy x-ray sources lead to the first measurements tests with a Cu-Kα x-ray source 12 , 13 . The approach was also extended to even lower-energy sources in synchrotron to study the latent image in extreme ultraviolet (EUV) resist with resonant x-ray measurements 14 …”

Section: Introductionmentioning

confidence: 99%

Reconstruction of the in-depth profile of line gratings with critical dimension grazing incidence small angle x-ray scattering on laboratory equipment

Freychet

Rademaker

Blancquaert

et al. 2023

J. Micro/Nanopattern. Mats. Metro.

View full text Add to dashboard Cite

We present a reconstruction of the in-depth profile of line gratings using criticaldimension grazing incidence small angle x-ray scattering with a compact Cu-Kα x-ray source mounted on a laboratory small angle x-ray scattering (SAXS). By taking advantage of the grazing-incidence configuration and with a rotation of the gratings under the x-ray beam, several orders of the Bragg rods were probed and led to the extraction of the in-depth profile of the lines. The extracted in-depth profile is compared with 3D atomic force microscopy results. The methodology developed mimics the one of critical dimension SAXS measurements, in transmission, to enable future comparison between the two approaches as well as building complementary modeling. These results open new perspectives for in-line x-ray metrology since the Cu-Kα x-ray source is widely spread and used by the x-ray community.

show abstract

Characterization of cross sectional profile of nanostructure line grating using small angle x-ray scattering

Cited by 10 publications

References 0 publications

Verification metrology system by using inline reference metrology

Verification metrology system by using inline reference metrology

Reconstruction of the in-depth profile of line gratings with critical dimension grazing incidence small angle x-ray scattering on a laboratory equipment

Reconstruction of the in-depth profile of line gratings with critical dimension grazing incidence small angle x-ray scattering on laboratory equipment

Contact Info

Product

Resources

About