Characterization of epitaxial TiO2 films prepared by pulsed laser deposition

Yamamoto, S.; Sumita, T.; Yamaki, Tetsuya; Miyashita, Atsumi; Naramoto, H.

doi:10.1016/s0022-0248(01)01986-8

Cited by 58 publications

(50 citation statements)

References 15 publications

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“…Many different techniques, such as sputtering [10][11][12][13][14][15], laser ablation [16][17][18], growth from solution [19][20][21][22], chemical vapor deposition [23][24][25][26][27] and molecular beam epitaxy (MBE) [28][29][30] have been employed for thin film TiO 2 deposition. Among these methods, molecular beam epitaxy and metal organic vapor deposition offer the greatest potential for low point defect densities, because of the high purity of the source materials and because they are low energy growth techniques that allow for conditions closer to equilibrium than sputtering or laser ablation.…”

Section: Introductionmentioning

confidence: 99%

Microstructure of epitaxial rutile TiO2 films grown by molecular beam epitaxy on r-plane Al2O3

Engel‐Herbert

Jalan

Cagnon

et al. 2009

Journal of Crystal Growth

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Section: Introductionmentioning

confidence: 99%

Microstructure of epitaxial rutile TiO2 films grown by molecular beam epitaxy on r-plane Al2O3

Engel‐Herbert

Jalan

Cagnon

et al. 2009

Journal of Crystal Growth

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“…Meanwhile, today a large amount of information has accumulated on processes induced by thermal energy, delivered to the initial reagents by light mostly in the form of laser radiation. Thus, for example, methods of laser deposition (laser ablation), in which the material of the target is vaporized at the focus of an intense laser beam and is subsequently deposited in the form of colloidal solutions and nanocrystalline films, have been used successfully for the synthesis of TiO 2 [257][258][259][260][261][262], ZnO [263][264][265][266][267][268][269][270][271][272][273], SnO 2 [274], WO 2 [275], FeO [276], Fe 2 O 3 [277], WS 2 [278], CdSe and CdTe [279], Bi 3 Te 2 [280], Se [281], and Si [282,283] nanoparticles and TiO 2 /WO 3 [284] and TiO 2 /Pt [285] nanocomposites.…”

Section: Formation Of Semiconductor Nanoparticles and Change Of Theirmentioning

confidence: 99%

Photochemical formation of semiconducting nanostructures

et al. 2008

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Existing data on photochemical and photocatalytic approaches to the formation of semiconducting nanoparticles and also binary semiconducting nanostructures and nanocomposites of semiconductors with metals and polymers are reviewed. The nature of the effect of irradiation on the synthesis and properties of the obtained nanostructures and the possibility of photocatalytic control of the structural and spectral parameters of nanostructural semiconducting systems are examined.The accumulation of data on the properties of semiconducting (SC) nanomaterials, which has occurred particularly rapidly in the last 7-10 years, has opened up ever more alluring prospects for their application as light-sensitive and light-emitting components in nanophotonics [1-3], nanophotocatalysis [2,[4][5][6][7], biosensorics [8][9][10][11], and other important fields. The possibility of practical utilization is an important factor that has stimulated the search for and study of the processes involved in the formation of nanomaterials. On this account an enormous number of publications have now accumulated on the improvement of existing and development of new methods for the synthesis of semiconducting nanoparticles and nanostructures (e.g., see the reviews [6, 12-15]). A special position among them is occupied by methods based on photochemical transformations conducted either for the purpose of synthesis and directing it along a desired path or for improving the characteristics of nanostructures produced by other methods.Photochemical methods of synthesis have proved more effective than the production of nanomaterials by traditional synthetic approaches, and in a number of cases only they make it possible to achieve the assigned aim. For this reason the synthesis of semiconducting nanostructures and their modification under the conditions of photoirradiation are constantly attracting the attention of investigators, and the number of publications devoted to these questions is constantly increasing. We note, however, that they nevertheless remain disjointed.In view of the foregoing an attempt is made in the present article to organize existing data, to identify the most important directions for research and development, and thus to assess the current state of development of photochemical approaches to the formation of semiconducting nanostructures. Analysis of data on the photochemical formation and post-synthesis photochemical treatment of semiconducting nanostructures and multicomponent nanocomposites, including the nanoparticles of metals and polymers in addition to semiconductors, showed that in spite of the variety and diversity of the proposed approaches all the papers can be ascribed to only three courses: synthesis, synthesis control, and changing the characteristics of the semiconducting nanostructures. For this reason in this review photochemical approaches to the synthesis of nanoparticles of metal chalcogenides, binary semiconducting nanostructures, and nanocomposites consisting of semiconducting and conducting polymers are examin...

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“…As known, control at the nano-scale of material structure during the synthesis process offers the possibility of designing high quality devices with improved and pre-defined performances. Nano-crystalline TiO 2 thin films have been prepared up to now by a large variety of growth techniques, such as metal-organic chemical vapor deposition (MOCVD) [22,23], reactive magnetron sputtering [24,25], sol-gel chemistry [26], filtered cathodic vacuum arc [27] and pulsed laser deposition (PLD) [28][29][30][31][32][33][34][35][36], and PLD has important advantages over other deposition methods. Through the appropriate adjustments of process parameters such as laser fluence, number of laser pulses, ambient reactive gas pressure and substrate temperature PLD allows for the precise control of the growth process and, thus, the synthesized thin films' crystalline structure, stoichiometry, thickness, as well as their adherence to the substrate surface [37][38][39], However, in general the TiO 2 films prepared by PLD mainly consisted of mixtures of crystal phases [30,[33][34][35], It was shown that the formation of pure, monophasic TiO 2 thin films of either rutile or anatase structure requires, besides the adjustment of the process parameters, special substrate materials ensuring small in-plane lattice mismatch at the films-substrate interface [28,36].…”

Section: Introductionmentioning

confidence: 99%

Investigation of structural and optical properties of UHV deposited titanium thin films under thermal oxidation

Rafizadeh

2013

Optik

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Characterization of epitaxial TiO2 films prepared by pulsed laser deposition

Cited by 58 publications

References 15 publications

Microstructure of epitaxial rutile TiO2 films grown by molecular beam epitaxy on r-plane Al2O3

Microstructure of epitaxial rutile TiO2 films grown by molecular beam epitaxy on r-plane Al2O3

Photochemical formation of semiconducting nanostructures

Investigation of structural and optical properties of UHV deposited titanium thin films under thermal oxidation

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