“…Hence, typically, dielectric (e.g., SiO x , Al 2 O 3 , ZnO, and Cr 2 O 3 ) and metal (e.g., Ti and Cr) barrier layers are fabricated on SS substrates. [7][8][9][10][11][12][13][14] In addition to the barrier effect, dielectric layers are also used for ensuring good electrical insulation between the metal substrate and the monolithically interconnected PV cells. [15] Sol-gel and anodization methods are used to produce thick layers during cell production.…”