Characterization of H₂O- inductively coupled plasma for dry etching

Pretreatment of polypropylene films for following technological processes, part 2: The use of low temperature plasma method

“…Peyrous et al26 have modeled the elementary processes in the plasma of water vapor resulting in the formation of OH radicals and hydrogen atoms in the collision of water molecules with electrons as well as by means of atomic oxygen: e* + H 2 O → OH + H + e; O( 1 D) + H 2 O → OH + OH. The formation of OH radicals in plasma has been considered in several articles 27–30…”

“…A further result of the plasma treatment is the disappearance of absorption band at 765 cm −1 . This band identifies the deformation vibration of methylene groups (CH 2 ) 39. The lack of this band would indicate etching processes and the elimination of polymethylene groups in the surface layer.…”

“…The identification of the atomic and molecular plasma species was carried out on the basis of data base 22. and the articles23–30…”

Optical radiation in breakdown of the acceleration gap of a forevacuum pressure, wide-aperture, plasma-cathode, pulsed electron source

“…Thus the optical spectrum contains atomic lines of Н and O, molecular lines of N 2 , and molecular lines of OH from water vapor. The atomic lines of O and H, like the OH lines of, can also be due to water vapor [11]. In addition to the lines of neutral atoms and molecules, the spectrum reveals lines of singly charged N 2 + ions which are most intense at 391.4 and 427.1 nm.…”

An inductive RF discharge in water vapor for atomic-emission spectrometry

“…Although water ICP has been studied in a number of paper [6][7][8], appropriate methods for its diagnostics are not available, which makes it difficult to develop systems using water ICP for industrial and analytical applications. Therefore, the study of the energy and spectral characteristics and the search for regularities that allow estimating the parameters of water ICP remains an important problem.…”