Characterization of indium–tin oxide sputtering targets showing various densities of nodule formation

Preparation and sintering of indium–gallium–zinc oxide ceramics with different zinc oxide contents

“…The effects of various sputtering parameters, particularly the oxygen partial pressure, on the properties of IGZO films have been the focus of previous research [1][2][3][4][5][6][7][8][9]. Recently, several studies [13][14][15][16][17][18][19][20][21] have demonstrated that the characteristics of the sputtering targets for various oxide thin films play important roles on the preparation and the performances of sputtered films. Thus, in addition to the sputtering parameters, the sputtering target is an important factor in determining the properties of oxide films.…”

Synthesis and sintering of indium tin oxide nanoparticles by citrate-nitrate combustion method

“…The properties of ITO target play an important role in magnetron sputtering of ITO films and the target should be as dense as possible. A dense target increases deposition rate, exhibits a more stable resistivity, and avoids "black spots" [8]. Fig.…”

“…It is well known that the sputtering efficiency and properties of the ITO films are strongly dependent on the characteristics of ITO target, and the most important parameter is target density. Many researches have been carried out for achieving higher ITO target density, microstructural homogeneity and lower fabrication cost [1][2][6][7][8]. Obtaining monodispersed ITO particles with high purity, and high sinterability is of the first importance for ITO materials.…”

Enhancement of the densification and mechanical properties of aluminum-doped zinc oxide ceramics by hot isostatic pressing

“…To date, several studies have indicated the importance of the effects of the sintered density [23,24], microstructural uniformity [25], stoichiometry [22,26], and electrical properties [10,11] of the oxide sputtering targets on the film properties and the stability of sputtering. An ITO target with a higher sintered density can be used to produce an ITO film with lower resistivity, though the visible transmittance of an ITO film does not apparently change with the ITO target [23].…”

“…An ITO target with a higher sintered density can be used to produce an ITO film with lower resistivity, though the visible transmittance of an ITO film does not apparently change with the ITO target [23]. Moreover, when an ITO target with a higher sintered density and more uniform SnO 2 distribution is used, the nodule and arcing phenomena are inhibited [24,25]. On the other hand, an AZO target with lower resistivity can be used to produce a more homogeneous film having lower resistivity [10,11].…”