Characterization of Mo-6Ta alloy targets and its magnetron sputtering deposited thin film

Mo10W billets are fabricated via vacuum sintering (VS), hot pressing (HP), and VS + HP process. The results show that the Mo10W prepared by VS has good uniformity, even when the sintering temperature is as low as 1600 °C. However, the relative density of this alloy is only 95.37% when the sintering temperature is increased to 1900 °C. A high sintering temperature coarsens the grains. The relative density of HP-based Mo10W reaches 99.05% after sintering at 1500 °C, but its distributions of Mo and W are uneven. The Mo and W distributions of the VS + HP Mo10W alloy are uniform and its relative density reaches 98.1%. This work provides a new method for simultaneously improving the uniformity and density characteristics of Mo alloys.

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Characterization of Mo-6Ta alloy targets and its magnetron sputtering deposited thin film

Cited by 3 publications

References 19 publications

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Low-oxygen, uniform, and dense Mo10Nb alloys obtained by combining in situ deoxygenation and mechanical alloying

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Dense and uniform Mo10W alloy prepared by combining a vacuum sintering process with a hot-pressing process

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