1992
DOI: 10.1295/koron.49.353
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Characterization of Multi-Component Polymer Systems by Field Emission-STEM at Low Accelerating Voltages.

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Cited by 4 publications
(3 citation statements)
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“…[21][22][23] Shiraga et al investigated the bulk phaseseparated structure of the immiscible PS/poly(methyl methacrylate) (PS/PMMA) blend film on the basis of field-emission scanning electron microscopic observation. 21 They revealed that macroscopic phase-separated domains with a few micrometers in diameter were formed in the bulk region of the thick film. Winnik and co-workers investigated the depth profiling of the phaseseparated structure for the PS/PMMA blend film on the basis of laser confocal fluorescence microscopic observation.…”
Section: Introductionmentioning
confidence: 99%
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“…[21][22][23] Shiraga et al investigated the bulk phaseseparated structure of the immiscible PS/poly(methyl methacrylate) (PS/PMMA) blend film on the basis of field-emission scanning electron microscopic observation. 21 They revealed that macroscopic phase-separated domains with a few micrometers in diameter were formed in the bulk region of the thick film. Winnik and co-workers investigated the depth profiling of the phaseseparated structure for the PS/PMMA blend film on the basis of laser confocal fluorescence microscopic observation.…”
Section: Introductionmentioning
confidence: 99%
“…Internal phase-separated morphology for immiscible polymer blend films has been studied by several groups. Shiraga et al investigated the bulk phase-separated structure of the immiscible PS/poly(methyl methacrylate) (PS/PMMA) blend film on the basis of field-emission scanning electron microscopic observation . They revealed that macroscopic phase-separated domains with a few micrometers in diameter were formed in the bulk region of the thick film.…”
Section: Introductionmentioning
confidence: 99%
“…Cantow et al firstly attempted the imaging of distributions of low atomic number elements in some multiphase polymer materials with ESI mode in EFTEM_ 5 -7 However, no works have been appeared regarding the elemental distribution imaging for the polymers which have been frequently used as components for polymer alloys and blends such as polyamide (PA) and poly(methylmethacrylate) (PMMA). The reason for that may be the low sensitivity of N and O in EELS in specimens where carbon is the predominant element, 8 the loss of light elements through the radiation damage 9 and the difficulties for the preparation of thin unstained specimens especially for PA to be necessary for the reduction of the plural inelastic scattering. 10 Preparing thin unstained specimens less than 50 nm and introducing a "Imaging Plate" (IP) system for a recording medium, we here present the imaging of morphologies by elemental mapping in the blends ofpolyamide6 (PA6)/polycarbonate (PC) and polystyrene (PS)/PMMA.…”
mentioning
confidence: 99%