The film thickness dependence of surface structure for immiscible
polystyrene/poly(methyl
methacrylate) (PS/PMMA) films was investigated on the basis of atomic
force microscopic observation
and X-ray photoelectron spectroscopic measurement. In the case of
the PS/PMMA film of 25 μm thickness,
the air−polymer interfacial region was covered with a PS rich
overlayer due to its lower surface free
energy compared with that of PMMA and a well-defined macroscopic
phase-separated structure was formed
in the bulk phase. Also, in the case of the PS/PMMA thin film of
100 nm thickness, the phase-separated
structure, in which the PMMA rich domains separated out of the PS rich
matrix, formed at the film
surface. The formation of the surface structure for the PS/PMMA
thin film can be attributed to either
the chain conformation or chain aggregation structure being frozen at
the air−polymer interfacial region
before the formation of a PS rich overlayer due to the fairly fast
evaporation of solvent molecules. On
the other hand, the two-dimensional PS/PMMA ultrathin film of 10.2 nm
thickness did not show distinct
phase-separated structure. When the film thickness became thinner
than 10.2 nm, the two-dimensional
PS/PMMA ultrathin film of 6.7 nm thickness showed fine and distinct
phase-separated structure with
the domain size of a few hundred nanometers. This structure can be
designated as “mesoscopic phase-separated structure”. The surface phase state for the
two-dimensional PS/PMMA ultrathin films can be
explained by the film thickness dependence of both the interaction
parameter and the degree of
entanglement among polymer chains.