2022
DOI: 10.21203/rs.3.rs-2077356/v1
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Characterization of nanometric thin films with far-field light

Abstract: The fabrication and characterisation of ultra-thin, transparent films is paramount for protective layers on semiconductors, solar cells, as well as for nano-composite materials and optical coatings. Similarly, the probe volume of nano-sensors, as well the calibration of axial distances in super-resolution microscopies, all require the metrology of axial fluorophore distances. However, the reliable production and precise characterisation of such nanometric thin layers are difficult and labor-intense and they re… Show more

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