2015
DOI: 10.1016/j.nimb.2015.04.010
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Characterization of nitrogen ion implanted TiO2 photocatalysts by XAFS and XPS

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Cited by 12 publications
(10 citation statements)
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“…In this regard, nitrogen-doping has been considered one of most effective approaches to improve photocatalytic activity of TiO 2 in the visible region [25]. The methods currently reported to achieve it superficially or by replacing atoms include ion implantation [26], physical vapor deposition [27], and spray pyrolysis [28], as well as variants of the known process of sol-gel. An alternative method to include nitrogen is the refluxing methodology, which consists of inducing intimate contact between the nitrogen source precursor (hydrazine, urea, ethylene diamine, etc.)…”
Section: Introductionmentioning
confidence: 99%
“…In this regard, nitrogen-doping has been considered one of most effective approaches to improve photocatalytic activity of TiO 2 in the visible region [25]. The methods currently reported to achieve it superficially or by replacing atoms include ion implantation [26], physical vapor deposition [27], and spray pyrolysis [28], as well as variants of the known process of sol-gel. An alternative method to include nitrogen is the refluxing methodology, which consists of inducing intimate contact between the nitrogen source precursor (hydrazine, urea, ethylene diamine, etc.)…”
Section: Introductionmentioning
confidence: 99%
“…In our previous study, we have found that O–Ti–N species in TiO 2 contributed to visible-light responsiveness. 1921 Thus, the formation of O–Ti–N bonding in TiO x N y is most likely the origin of the photocatalytic water splitting under visible-light irradiation. Actually, as shown in Figures 1 and 2, higher nitriding temperature led to higher photocatalytic activity with the increase in the intensity of the peak due to TiO x N y in XRD.…”
Section: Discussionmentioning
confidence: 99%
“…In the fitting procedure of the bulk Si (substrate) XRR curve the X-ray beam energy was assumed to 6 keV, material (Si) thickness was set to 1 mm (infinitely thick for this energy) and initial Si density to 2.33 g/cm 3 . The fitting parameters were: density and roughness of the substrate.…”
Section: Unmodified Tio 2 Nanolayersmentioning
confidence: 99%
“…We also have made the attempt to model our samples with only one layer on the substrate, but it was not possible to obtain an acceptable fit of the reflectivity curves. Finally, in the fitting procedure of the TiO 2 nanolayers the X-ray beam energy was set to 6 keV, initial nanolayer thicknesses were set to 25, 50, and 75 nm, respectively, and initial TiO 2 density to 4.0 g/cm 3 . The initial top layer density was set to 2.0 g/cm 3 and the layer thickness to 2 nm.…”
Section: Unmodified Tio 2 Nanolayersmentioning
confidence: 99%
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