2012
DOI: 10.5755/j01.ms.18.2.1913
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Characterization of Palladium-based Thin Films Prepared by Plasma-enhanced Metalorganic Chemical Vapor Deposition

Abstract:

The plasma-enhanced metalorganic chemical vapor deposition (PEMOCVD) was used to prepare palladium–based thin films starting with palladium (II) acetylacetonate precursor (Pd(acac)2) mixed with argon (carrier gas). To characterize chemical structure and morphology of deposited films Raman spectroscopy and electron diffraction techniques were used. The energy dispersive X-ray microanalysis (EDX) was applied to specify composition of films. The film thickness was estimated by ellipsometric measurem… Show more

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Cited by 4 publications
(3 citation statements)
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“…1. A detailed description of the reactor was given elsewhere [40]. However, some changes have been made in the form of additional reservoir for liquid monomer with a separate system of temperature stabilization.…”
Section: Deposition Technologymentioning
confidence: 99%
“…1. A detailed description of the reactor was given elsewhere [40]. However, some changes have been made in the form of additional reservoir for liquid monomer with a separate system of temperature stabilization.…”
Section: Deposition Technologymentioning
confidence: 99%
“…Thin films containing FeOX were deposited in a parallel-plate RF (13.56 MHz) plasma reactor presented in [12], using iron pentacarbonyl (Sigma Aldrich, 99 %) as the precursor and mixture of oxygen (99.999 %) and nitrogen (99.999 %), in a ratio of 1:4, as a carrier gas. Both the precursor container and the entire gas feed line were heated up to 329 K. The total pressure in the reactor chamber was 5.2 Pa, the glow discharge power density was 355 W/dm 3 , and the flow rates of precursor vapor and carrier gas were 0.035 sccm and 0.90 sccm, respectively.…”
Section: Methodsmentioning
confidence: 99%
“…An additional O 2 plasma step in each cycle yielded virtually 100% pure palladium thin films composed of nanometric crystalline grains, the size of which could be controlled by the number of deposition cycles [116]. Investigations performed on Pd films prepared by the typical PECVD process (from Pd(acac) 2 ) showed that the as-deposited films were amorphous and only after thermal treatment at 623 K, Pd nanocrystalline clusters of 5-10 nm size were formed [114].…”
Section: Noble Metal-based Filmsmentioning
confidence: 99%