Characterization of pentafluoropropane dissolved UV-nanoimprint resin

Abstract

Bubble defects in ultraviolet (UV) nanoimprinting can be eliminated by carrying out the procedure in pentafluoropropane (PFP) gas ambient. Furthermore, the viscosity of the UV-nanoimprint resin is about one-fifth lower than that in air. The authors assume from these results that the PFP gas dissolves into the UV-nanoimprint resin, and the dissolved PFP might affect the characteristics of UV-nanoimprint resin. In this experiment, we analyzed the properties of PFP-dissolved UVnanoimprint resin using a Fourier transform infrared (FT-IR) spectrometer and contact-angle meter. First, we measured the FT-IR spectrum. The results for resins in PFP gas ambient showed a peak due to the stretching vibration of the C-F bond before and after UV irradiation. Next, the sliding angles and speeds of resins were measured by measurement of the sliding angle in air and PFP gas ambient. The sliding speeds in PFP gas ambient were five times those in air and the sliding angles were one-fourth lower than those in air. The increase in sliding speeds and the decrease in sliding angles in PFP gas ambient were due to the PFP gas dissolving into the resin.

Meniscus behavior under helium exposure for rapid resist spreading during nanoimprint lithography

“…For example, the contact angle of the resist on a plate changes under gas exposure. 13) In this report, we assume that the resist contact angle corresponds to the tip angle of the resist after UV curing. Generally, the relationship between surface tension and wettability is expressed by…”