Photovoltaic Solar Energy Conference 1981
DOI: 10.1007/978-94-009-8423-3_88
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Characterization of Plasma-Sprayed Silicon Layers as Possible Base Material for Solar Cell Fabrication

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1982
1982
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1983

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“…A. HOGARTHf As part of an investigation into polycrystalline silicon formed by the plasma-spraying technique for possible use in developing low-cost solar cells (Alaee and Hashemi 1980), the electrical properties of such polycrystalline layers were measured and were shown to exhibit higher electron mobility values than those characteristic of layers formed by the more conventional methods such as chemical vapour deposition (Kamins 1971).…”
mentioning
confidence: 99%
“…A. HOGARTHf As part of an investigation into polycrystalline silicon formed by the plasma-spraying technique for possible use in developing low-cost solar cells (Alaee and Hashemi 1980), the electrical properties of such polycrystalline layers were measured and were shown to exhibit higher electron mobility values than those characteristic of layers formed by the more conventional methods such as chemical vapour deposition (Kamins 1971).…”
mentioning
confidence: 99%