2017
DOI: 10.3390/en10040414
|View full text |Cite
|
Sign up to set email alerts
|

Characterization of the Diamond Wire Sawing Process for Monocrystalline Silicon by Raman Spectroscopy and SIREX Polarimetry

Abstract: Abstract:A detailed approach to evaluate the sub-surface damage of diamond wire-sawn monocrystalline silicon wafers relating to the sawing process is presented. Residual stresses, the presence of amorphous silicon and microcracks are considered and related to diamond wire velocity and cutting ability. In particular, the degree of amorphization of the wafer surface is analyzed, as it may affect the etching performance (texturing) during solar cell manufacture. Raman spectroscopy and Scanning Infrared Stress Exp… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2018
2018
2024
2024

Publication Types

Select...
4
2
1

Relationship

0
7

Authors

Journals

citations
Cited by 21 publications
(2 citation statements)
references
References 11 publications
0
2
0
Order By: Relevance
“…In the MDWS process, surface quality is a crucial indicator for assessing its quality and process efficiency. This, in turn, directly impacts the subsequent processing costs [42,43]. SiC has covalent Si and C bonds with two different polarities of Si and C-face, leading to notable variations in its physical, chemical, and electrical properties [44].…”
Section: Surface Roughnessmentioning
confidence: 99%
“…In the MDWS process, surface quality is a crucial indicator for assessing its quality and process efficiency. This, in turn, directly impacts the subsequent processing costs [42,43]. SiC has covalent Si and C bonds with two different polarities of Si and C-face, leading to notable variations in its physical, chemical, and electrical properties [44].…”
Section: Surface Roughnessmentioning
confidence: 99%
“…Würzner et al studied the residual stress on the surface layer of silicon wafers sawn by fixed diamond wire sawing using Raman characterization. Their experimental results show that higher wire speed leads to lower residual stress, but with more amorphous silicon formation [ 11 ]. Yang et al used the infrared polariscope method to measure the residual stress on the surface of the full-size wafer, and studied the effects of residual stress and surface defects on the fracture strength of silicon wafers [ 12 ].…”
Section: Introductionmentioning
confidence: 99%