Characterization of the Nonlinear Susceptibility of Monolayer MoS2 using Second- and Third-Harmonic Generation Microscopy

Abstract

Abstract:Second-and third-harmonic generation microscopy of monolayer MoS 2 is reported for imaging and characterization of the material's nonlinearity. A telecommunication wavelength pump is used, revealing the material's promise for use in nonlinear optical devices.

Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS 2 using multiphoton microscopy

“…This technique, however, is limited to samples with an odd number of layers, as both bulk and even-layer-count few-layer crystals exhibit inversion symmetry; thus, second-order nonlinear effects are electric dipole forbidden. An attractive alternative is to harness third-harmonic generation (THG), which occurs irrespective of inversion symmetry [12,23,24]. Wang et al recently reported THG from MoS 2 thin films of 7-15 atomic layers [21], suggesting THG could provide complementary information in multiphoton microscopy.…”