2018
DOI: 10.1116/1.5009906
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Characterization of thin carbon films capable of low-field electron emission

Abstract: Previous experiments have demonstrated that carbon nanoisland films (or disordered quantum-dot arrays) deposited on silicon wafers may possess the property of low-field electron emission. This paper presents our new work on comparative characterization of emitting and nonemitting thin carbon films. The experimental results acquired by Auger spectroscopy, electron energy loss spectroscopy, Anderson's technique for workfunction measurement, and secondary-emission techniques confirmed that the emitting films are … Show more

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Cited by 28 publications
(14 citation statements)
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“…The emission of electrons from negative tips is more efficient than their emission from positive ones. Besides, nanoparticles [35] and dielectric films, including carbon [36] , lower the field emission threshold. Therefore, the start voltage of negative coronas is lower.…”
Section: Initiation Of Ball and Cylindrical Streamersmentioning
confidence: 99%
“…The emission of electrons from negative tips is more efficient than their emission from positive ones. Besides, nanoparticles [35] and dielectric films, including carbon [36] , lower the field emission threshold. Therefore, the start voltage of negative coronas is lower.…”
Section: Initiation Of Ball and Cylindrical Streamersmentioning
confidence: 99%
“…An important difference between our previous experiments with thin carbon films [38][39][40] and the present work consists in different structures of as-fabricated films. The carbon films studied in [38][39][40] initially comprised nanoislands, whereas in this work (and in [63]), due to technological limitations, we deposited continuous films of metals. The process of agglomeration of flat thin films deposited on non-wettable substrates is known as solid-state dewetting [80,81].…”
Section: Comparison With Literature Datamentioning
confidence: 70%
“…However, as it has been noted in the Introduction, some of these mechanisms cannot be realized in films and structures of nm-scale thickness. In [39,62], we have proposed a special emission model for islet carbon films deposited on oxidized silicon wafers. The new data on LMF emission from metal thin films force us to revise this model.…”
Section: Comparison With Literature Datamentioning
confidence: 99%
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