2016
DOI: 10.1590/1980-5373-mr-2015-0058
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Characterization of Thin Carbon Films Produced by the Magnetron Sputtering Technique

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Cited by 15 publications
(2 citation statements)
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“…In recent publications, our group has reported on the preparation of carbon thin films by magnetron sputtering 17,18 . This work presents new results of Raman Spectroscopy for carbon thin films produced by the magnetron sputtering technique, and also determines the influence of different parameters as deposition time, buffer-layer (Co, Cu and Ni), substrate type and heat treatment on the crystallinity degree of the films.…”
Section: Introductionmentioning
confidence: 99%
“…In recent publications, our group has reported on the preparation of carbon thin films by magnetron sputtering 17,18 . This work presents new results of Raman Spectroscopy for carbon thin films produced by the magnetron sputtering technique, and also determines the influence of different parameters as deposition time, buffer-layer (Co, Cu and Ni), substrate type and heat treatment on the crystallinity degree of the films.…”
Section: Introductionmentioning
confidence: 99%
“…With the same other growth conditions, a growth temperature window, which covers 900°C, was identified for the formation of continuous high-quality h-BN films in the heterostructures as shown in figure S2 (supporting information). Thermodynamically, G growth on Co can start at a temperature of around or above 700°C (T G ) [30,31]. The black hatching areas in figure 1(a) show the C concentration in Co substrate at different growth regions (i.e., 1, 2, and 3), and the black horizontal dashed lines display the C solubility levels in Co substrate at designated temperatures (i.e., T 0%C , T G and T growth ).…”
Section: Methodsmentioning
confidence: 99%