Interposers will become more and more important for advanced electronic systems and through substrate vias are essential for the 3-D integration. A straight via is necessary because a tapered hole is accompanied by large signal loss. This article reports a straight through-glass-via (TGV) fabricated by femtosecond laser-assisted chemical etching (FLACE). The femtosecond laser was used to modify the glass substrates, and the modified glass samples were etched with hydrofluoric acid (HF) solution to form TGV. The effects of key processing parameters, including laser pulse energy, the number of burst pulses, and the HF solution concentration, on the TGV taper profile, were systematically investigated. It was found that the TGV taper sidewall angle increased decreased with increasing laser pulse energy and HF solution. And the number of bursts should be optimized because more than 10 bursts would prevent the formation of TGV. The study shows via etched in 3wt% HF after irradiation with 3 bursts of 60 μJ can become approximately vertical. Among the three processing parameters, HF concentration was found to be the most crucial parameter. This work can serve as a critical reference for applications of TGV in high-performance 3D integrated circuits.