2007
DOI: 10.1016/j.electacta.2007.07.049
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Characterization of ultramicroelectrode arrays combining electrochemical techniques and optical microscopy imaging

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Cited by 34 publications
(39 citation statements)
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“…Voltammetric responses of a bare UMEA showed the characteristic steady-state current of the redox probe with a current density of 3.64 mA cm À2 (see Figure 1, curve a and Table 2), which is 14 times higher than that of the microelectrode (0.26 mA cm À2 ) (Table 2). Remarkably, the electrodeposition of AuNPs on the UMEA surface highly increased Table 2), which is likely to be related to a slight increase in the individual disc radius due to the electrodeposition of AuNPs [38]. Based on the higher surface area of AuNP-modified UMEAs (Table 1) and the apparent catalytic effect of AuNPs, an enhanced electrochemical response in terms of electron transfer facility when SAMs were formed on their surface is expected, as will be shown below.…”
Section: Electrochemical Characterization Of Bare Substratesmentioning
confidence: 88%
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“…Voltammetric responses of a bare UMEA showed the characteristic steady-state current of the redox probe with a current density of 3.64 mA cm À2 (see Figure 1, curve a and Table 2), which is 14 times higher than that of the microelectrode (0.26 mA cm À2 ) (Table 2). Remarkably, the electrodeposition of AuNPs on the UMEA surface highly increased Table 2), which is likely to be related to a slight increase in the individual disc radius due to the electrodeposition of AuNPs [38]. Based on the higher surface area of AuNP-modified UMEAs (Table 1) and the apparent catalytic effect of AuNPs, an enhanced electrochemical response in terms of electron transfer facility when SAMs were formed on their surface is expected, as will be shown below.…”
Section: Electrochemical Characterization Of Bare Substratesmentioning
confidence: 88%
“…A miniaturized Ag/AgCl pseudo-reference electrode RC6 (50-mm length, 1.5-mm external diameter from World Precision Instruments) was used for electrodeposition experiments. Au microelectrodes and UMEAs were simultaneously fabricated at wafer level at the IMB-CNM Clean Room facilities by standard photolithographic techniques, as described elsewhere [38]. .…”
Section: Apparatus and Electrodesmentioning
confidence: 99%
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“…The electrodes set was fabricated on a silicon substrate at the IMB-CNM clean room facilities, according to a previously described photolithographic process (Orozco et al, 2007).…”
Section: Electrochemical Transducermentioning
confidence: 99%