Characterization of W-N Alloys Formed By Sputter Deposition

Affolter, K.; Kattelus, Hannu; Nicolet, M.‐A.

doi:10.1557/proc-47-167

Cited by 39 publications

(28 citation statements)

References 12 publications

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“…The structure identi®cation indicated, as expected, the presence of the W 2 N fcc phase [10]. Due to nitrogen excess it is more correct to indicate this as a W 2 N 1 x phase, as proposed by Affolter et al [11]. The nitrogen excess should be responsible for the deviations observed in the interplanar distances, because by occupying the interstitials the nitrogen promotes lattice distortions.…”

Section: Tungsten Nitride Single Coatingssupporting

confidence: 57%

The influence of ductile interlayers on the mechanical performance of tungsten nitride coatings

Vieira¹,

Ramos²

1999

Journal of Materials Processing Technology

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Multilayers between ceramic materials and metallic materials can combine the high hardness and wear resistance of the ceramic layers with the toughness and mechanical strength of the metallic layers. This work is aimed at the production and characterisation of tungsten nitride/titanium (or nickel) multilayers. The coatings, deposited by magnetron sputtering, are characterised with respect to their structure, morphology and hardness. The adhesion to the substrate is evaluated by a scratch-test technique, as it constitutes a fundamental prerequisite.The choice of titanium and nickel as interlayering materials was made in order to study the role of materials with elevated plasticity, but with different reactivities. Titanium tends to react chemically with other materials, namely, ferrous oxides and nitrides. Nickel has low chemical reactivity but has the same crystallographic structure as the W 2 N phase. All of the multilayer coatings produced have a total thickness of 4 mm. The hardness of the multilayers, deposited with different ceramic/metal thickness ratios, decreases with the thickness of the ductile metallic layers. When the metal thickness is too high it causes the spalling of the coatings. The optimal medium critical load (65 N) is obtained with a ceramic/metal ratio equal to four. Even though the type of bond is different, the adhesion of the multilayers is not in¯uenced by the substitution of titanium with nickel. The deposition process yields well-adhered and suf®ciently hard multilayer coatings when compared with the ceramic single layers. #

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Section: Tungsten Nitride Single Coatingssupporting

confidence: 57%

The influence of ductile interlayers on the mechanical performance of tungsten nitride coatings

Vieira¹,

Ramos²

1999

Journal of Materials Processing Technology

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“…The presence of the hexagonal ␦-WN phase only occurred in coatings containing more than 55 at.% of nitrogen and vestiges of other elements, e.g. oxygen (originated from the residual atmosphere in RF reactive magnetron sputtering studies [11,12], or purposely added to the reactive atmosphere in DC reactive magnetron studies [13]), or silicon [3].…”

Section: Chemical Composition and Structure At Room Temperaturementioning

confidence: 99%

Structural and tribological characterization of tungsten nitride coatings at elevated temperature

Polcar

Parreira

Cavaleiro

2008

Wear

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Transition metal nitrides exhibit excellent mechanical properties (hardness and Young's modulus), high melting point, good chemical stability and high electrical conductivity. However, tungsten nitrides still stand aside of the main attention. In our previous study, tungsten nitride coatings with different nitrogen content showed excellent wear resistance at room temperature. Nevertheless, many engineering applications require good tribological properties at elevated temperature. Thus, the present study is focused on the tribological behaviour (friction coefficient and wear rate) of tungsten nitride coatings at temperature up to 600 • C.The structure, hardness, friction and wear of tungsten nitride coatings with nitrogen content in the range 30-58 at.% prepared by dc reactive magnetron sputtering were investigated. The tribological tests were performed on a pin-on-disc tribometer in terrestrial atmosphere with Al 2 O 3 balls as sliding partner. The coating wear rate was negligible up to 200 • C exhibiting a decreasing tendency; however, the wear dramatically increased at higher temperatures. The coating peeled off after the test at 600 • C, which is connected with the oxidation of the coating.

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“…1 -3 Depending on the nitrogen concentration, reactively sputtered W 1 ~ xNxcould be either amorphous or polycrystalline. 4 • 5 It has been found that amorphous W 1 ~ ,N x is a better diffusion barrier than the polycrystalline forms. 1 -3 · 6 Although this superior performance could not be positively attributed yet to the lack of grain boundaries of the amorphous form because the atomic composition changes together with structure, it is known that diffusion barriers often fail through grain boundary diffusion.…”

Section: Introductionmentioning

confidence: 99%

“…The oxidation temperatures between 450 ·c and 575 •c were chosen to be in the range of interest for diffusion barrier application, at the same time staying below the recrystallization temperature of the amorphous nitride which was determined to be around 620 ·c. 4 The kinetics of the oxidation process is derived from 2 MeV 4 He + backscattering spectra.…”

Section: Introductionmentioning

confidence: 99%

Thermal oxidation of reactively sputtered amorphous W80N20 films

Pokela

Garden

et al. 1990

Journal of Applied Physics

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The oxidation behavior of reactively sputtered amorphous tungsten nitride of composition W 80 N 20 was investigated in dry and wet oxidizing ambient in the temperature range of 450 ·c-575 ·c. A single W0 3 oxide phase is observed. The growth of the oxide follows a parabolic time dependence which is attributed to a process controlled by the diffusivity of the oxidant in the oxide. The oxidation process is thermally activated with an activation energy of 2.5 ±0.05 eV for dry ambient and 2.35 ±0.05 eV for wet ambient. The pre-exponential factor of the reaction constant for dry ambient is 1.1 X 10 21 A 2 /min; that for wet ambient is only about lO times less and is equal to 1.3 X 10 20 A 2 /min.

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Characterization of W-N Alloys Formed By Sputter Deposition

Abstract: Thin films of W-N alloys have been prepared by reactive rf sputtering from a W target.Alloy compositions up to about 65at.%N can be achieved by this method.

Cited by 39 publications

References 12 publications

The influence of ductile interlayers on the mechanical performance of tungsten nitride coatings

The influence of ductile interlayers on the mechanical performance of tungsten nitride coatings

Structural and tribological characterization of tungsten nitride coatings at elevated temperature

Thermal oxidation of reactively sputtered amorphous W80N20 films

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