2020
DOI: 10.1109/ted.2020.3009646
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Characterizations of Electrolyte–Insulator–Semiconductor Sensors With Array Wells and a Stack-Sensing Membrane

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Cited by 7 publications
(11 citation statements)
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“…Compared to ISFET with 30 nm SiO 2 (−54 mV), hysteresis of device with APTES/SiO 2 stack-sensing membrane (21 mV) significantly improved, owing to the well-ordered amino groups (−NH 2 ). [97,98] The third one is "pH loop" factor. It was found that the hysteresis width in the FET-based sensor is dependent on measurement pH loop time, where the hysteresis increases with the improvement of loop time.…”
Section: Hysteresismentioning
confidence: 99%
“…Compared to ISFET with 30 nm SiO 2 (−54 mV), hysteresis of device with APTES/SiO 2 stack-sensing membrane (21 mV) significantly improved, owing to the well-ordered amino groups (−NH 2 ). [97,98] The third one is "pH loop" factor. It was found that the hysteresis width in the FET-based sensor is dependent on measurement pH loop time, where the hysteresis increases with the improvement of loop time.…”
Section: Hysteresismentioning
confidence: 99%
“…[16][17][18][19] Using the self-assembled monolayers is an alternative method to increase the reactive sites on the sensing membrane. As presented in previous studies, 20,21) using the 3aminopropyltriethoxysilane (APTES), which can be directly grown on the SiO 2 surface to form the sensing membrane stack, provides a favorable bio-interface. It can improve the sensitivity and suppress the non-ideality, such as hysteresis and drift, simultaneously.…”
Section: Introductionmentioning
confidence: 99%
“…Nanoimprint lithography (NIL) is a low-cost mass-production technology and an appropriate method for the dense and periodic pattern manufacturing. 15,[25][26][27][28]33 Besides, the silicon anisotropic/isotropic reactive-ion etching (RIE) processes for the undercutting or suspending structures, are CMOS comparable and wellestablished techniques for the nano/micro-electro-mechanical system (N/MEMS). 21,34,35 Using NIL and silicon anisotropic/isotropic RIE processes on the conventional silicon wafers can be an effective approach for the NW/GAA ISFETs development.…”
mentioning
confidence: 99%
“…With the surface modification by 3-aminopropyltriethoxysilane (C 9 H 23 NO 3 Si, APTES), surface terminals become the amine groups that show the biological affinity. Such sensing membrane of ISFETS, e.g., APTES/SiO 2 stack, 22,23,27,30,31 have offered and shown superior sensing properties for biochemical sensing applications. [22][23][24]27,30,31,36 In this study, by integrating the NIL technology and N/MEMS process, ISFETs with silicon wire array channels (SWA) and APTES/SiO 2 sensing membrane stacks were fabricated.…”
mentioning
confidence: 99%
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