Abstract:Biaxial ellipsometry is a technique that measures the dielectric tensor and thickness of a biaxial substrate, single-layer thin film, or multi-layer structure. The dielectric tensor of a biaxial material consists of the real and imaginary parts of the three orthogonal principal indices (n x + ik x , n y + ik y and n z + ik z ) and three Euler angles (Θ, Φ, ∆) to describe its orientation. The method utilized in this work measures an angle-of-incidence Mueller matrix from a Mueller matrix imaging polarimeter equ… Show more
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