Most of the Si quantum dot (QD) has been fabricated from SiO2/SiOx multilayer structure in order to create a homogeneous size. However, this structure achieved much lower efficiencies than expected in the Si QD photovoltaic field. It is because the Si QD generation and the photoexcited carrier transport is restricted by adjacent SiO2 layer. In this study, we applied a single SiOx:B layer fabrication method to the Si QD heterojunction solar cells. The number of generated Si QDs and the photo-excited carrier lifetime was maximized when the oxygen partial pressure and boron doping concentration parameters were 2.7x10 -5 Torr and 2.27 x 10 21 atoms/cm 3 , respectively. As a result, over than 17% power conversion efficiency of Si QD heterojunction solar cell was achieved using the single layer method.Supplementary material for this article is available