“…To understand the charge-lattice or spin-lattice interactions as well as electron-magnon scattering processes that exist across the LMO/LCMO interface grown using the CSD method (CSD method and PLD technique based comparison has been done for LMO/LCMO interface based resistivity behaviors only, other investigations are limited to the chemically grown LMO/ LCMO interface within the scope of the present report), temperature dependent resistivity data have been fitted theoretically using the ZDE polynomial law: r(T) = r 0 + r 2 T 2 + r n T n , where r 0 is the studied lower temperature resistivity (in the present case, r 0 represents the resistivity values recorded at 200 K), r 2 is the resistivity contributed through existing electronelectron, electron-phonon, and electron-magnon scattering processes, r n is the corresponding resistivity coefficient and n is the ZDE polynomial law parameter. [53][54][55][56][57][58][59] In the present case, it is necessary to point out that r 2 is the resistivity contributed by three major scattering processes, namely, electron-electron, electron-phonon and electron-magnon. However, at higher temperatures (i.e.…”