2015
DOI: 10.1007/s10854-015-3069-1
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Charge transport in pure and stabilized amorphous selenium: re-examination of the density of states distribution in the mobility gap and the role of defects

Abstract: We re-examine electron and hole transport in pure and stabilized amorphous selenium (a-Se) and attempt to construct a DOS distribution in the mobility gap below E c and above E v based on time-of-flight (TOF) transient photoconductivity measurements. First, we review the current status of a-Se, its recent use in commercial X-ray detectors, and the scientific information that is available in terms of its density of states (DOS). We review and describe a convenient multiple trapping transport mechanism to calcul… Show more

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Cited by 31 publications
(26 citation statements)
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“…The general ideas of TOF calculations we have used for modeling the carrier propagation in a‐Se is described in Ref. . Figure (a) shows a convincing agreement of MC and numerical calculations in “infinitely” thick samples with experimental data at one particular interruption time (118 μs), chosen simply to highlight the excellent agreement.…”
Section: Interpretation Of Iftof Results By Modeling Tof In “Infinitementioning
confidence: 81%
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“…The general ideas of TOF calculations we have used for modeling the carrier propagation in a‐Se is described in Ref. . Figure (a) shows a convincing agreement of MC and numerical calculations in “infinitely” thick samples with experimental data at one particular interruption time (118 μs), chosen simply to highlight the excellent agreement.…”
Section: Interpretation Of Iftof Results By Modeling Tof In “Infinitementioning
confidence: 81%
“…The theoretical modeling of a-Se [10,17] predicts the existence of C À 1 related DOS peaks below E v . Some experiments do indeed seem to support this result.…”
mentioning
confidence: 99%
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“…The density of states studied in detail by Kasap et al [5,6] is a featureless, monotonically decreasing distribution in energy. According to Benkhedir et al [7], in pure a-Se above the valance band edge E v DOS consists of a shallow defect level at ∼ 0.25 eV above E v and a defect level at ∼ 0.45 eV.…”
Section: Introductionmentioning
confidence: 97%