Functional Nanostructured Interfaces for Environmental and Biomedical Applications 2019
DOI: 10.1016/b978-0-12-814401-5.00002-5
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Chemical and physical methods for multifunctional nanostructured interface fabrication

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Cited by 27 publications
(20 citation statements)
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“…The high reproducibility and stability of the electrodes fabricated by this technique have also been demonstrated [47,55]. Other advantages of magnetron sputtering are the high adhesion of films to the substrates, a high deposition rate that permits a short manufacturing time for the electrodes, and the possibility to sputter any metal, alloy, or other components varying the gas plasma composition [133]. An additional advantage in terms of costs is the possibility to fabricate electrodes, either anode or cathode, at room temperature, decreasing the fabrication cost and time [47].…”
Section: Magnetron Sputtering Depositionmentioning
confidence: 89%
“…The high reproducibility and stability of the electrodes fabricated by this technique have also been demonstrated [47,55]. Other advantages of magnetron sputtering are the high adhesion of films to the substrates, a high deposition rate that permits a short manufacturing time for the electrodes, and the possibility to sputter any metal, alloy, or other components varying the gas plasma composition [133]. An additional advantage in terms of costs is the possibility to fabricate electrodes, either anode or cathode, at room temperature, decreasing the fabrication cost and time [47].…”
Section: Magnetron Sputtering Depositionmentioning
confidence: 89%
“…Of note, the deposition behavior can occur not only in nonreactive atmosphere with inert gas, but also in reactive atmosphere with inert and reactive gas. [ 138 ] As for reactive sputtering to form oxide and nitride films, the composition of gas must be controlled carefully.…”
Section: Engineering Workflow and Features Of Different Constructing ...mentioning
confidence: 99%
“…It exhibits several significant advantages over other vacuum coating techniques, a property that led to the development of a large number of commercial applications from microelectronic fabrication to simple decorative coatings. The advantages of magnetron sputtering are such as [35] • high deposition rates • ease of sputtering any metal alloy or compound • high-purity films…”
Section: Magnetron Sputteringmentioning
confidence: 99%
“…After that, These metal atoms are then deposited on the substrate material forming a metallic film. Magnetron sputtering increases the plasma density by introducing a magnetic field on the surface of the target cathode and utilizing the constraints of the magnetic field on the charged particles to increase the sputtering rate [34][35][36].…”
Section: • Extremely High Adhesion Of Filmsmentioning
confidence: 99%