Chemical and structural characterization of thin films using electrons and photons

Hartmann, Andreas; Lamb, Robert N.

doi:10.1002/(sici)1096-9918(200001)29:1<3::aid-sia697>3.0.co;2-#

Cited by 1 publication

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References 40 publications

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“…However, physical and structural properties influence the intensity, binding energy and line shape of photoelectron peaks. [12] Therefore, we can obtain complementary information on morphological change over thickness from the change of full width at half-maximum (FWHM) of the XPS peaks, their line shape and intensity, or binding energy shift. Figure 4 shows core level spectra of F 1s, Ir 4f, N 1s and O 1s peaks for Firpic films with thickness.…”

Section: Relative Atomic Sensitivity Factors Electron Attenuation Lementioning

confidence: 99%

Quantitative analysis of an organic thin film by XPS, AFM and FT‐IR

Park

et al. 2011

Surface & Interface Analysis

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We report the characterization of Firpic (iridium(III)bis[4,6-di-fluorophenyl]-pyridinato-N,C 2 ,]picolinate) organic thin film prepared by vacuum deposition to provide a systematic route to organic film quantification. To analyze the characteristics of thin Firpic films on a Si substrate, various techniques such as XPS, Fourier transform infra-red (FT-IR) spectrometer, and atomic force microscopy (AFM) are utilized. The Firpic films remain stable without surface morphological or compositional change during deposition and after exposure to X-ray irradiation or atmospheric environment, for which qualities these films are believed to be an ideal platform as a pure organic thin film. The monotonic increases in FT-IR and XPS intensities with film thickness are matching well with each other. In particular, from the XPS intensity analysis, the relative atomic sensitivity factors of the present system, electron attenuation length, and molecular density in the organic thin film can be evaluated. Copyright

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Section: Relative Atomic Sensitivity Factors Electron Attenuation Lementioning

confidence: 99%

Quantitative analysis of an organic thin film by XPS, AFM and FT‐IR

Park

et al. 2011

Surface & Interface Analysis

View full text Add to dashboard Cite

show abstract

Chemical and structural characterization of thin films using electrons and photons

Cited by 1 publication

References 40 publications

Quantitative analysis of an organic thin film by XPS, AFM and FT‐IR

Quantitative analysis of an organic thin film by XPS, AFM and FT‐IR

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