2010
DOI: 10.1007/s10853-010-4756-1
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Chemical bath deposition and characterization of CdSe thin films for optoelectronic applications

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Cited by 59 publications
(21 citation statements)
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“…Mostly CdSe thin films were prepared using physical and chemical methods such as thermal evaporation [11,12], sputtering [13], electron beam evaporation [9,14], chemical bath deposition [15][16][17][18][19], spray pyrolysis [8,20], electrodeposition [21,22], photoelectrochemical [23,24], SILAR [25] and photochemical deposition [26].…”
Section: Introductionmentioning
confidence: 99%
“…Mostly CdSe thin films were prepared using physical and chemical methods such as thermal evaporation [11,12], sputtering [13], electron beam evaporation [9,14], chemical bath deposition [15][16][17][18][19], spray pyrolysis [8,20], electrodeposition [21,22], photoelectrochemical [23,24], SILAR [25] and photochemical deposition [26].…”
Section: Introductionmentioning
confidence: 99%
“…CdSe thin films were prepared using different technique such as thermal evaporation(PVD) [1], sputtering [5], electron beam evaporation(EBE) [6], chemical bath deposition(CBD) [7], spray pyrolysis(SP) [8], electrodeposition [9], photoelectrochemical [10], SILAR [11] and photochemical deposition [12].…”
Section: Introducctionmentioning
confidence: 99%
“…Currently, the magnetron sputtering [10] and chemical methods, namely chemical bath [11e13], photochemical [14], and electrochemical deposition [15,16] etc., are the most used techniques for growth of CdSe films. In most cases the crystal quality of CdSe thin films deposited by these methods is rather low (small grain size, high concentrations of the extended defects and high level of microstrain) [11,12]. The modifications of the thermal vacuum deposition method such as hot-wall epitaxy and isothermal close-spaced sublimation allow to obtaining CdSe thin films with improved crystal properties [17e23].…”
Section: Introductionmentioning
confidence: 99%