Chemical design of quasi-one-dimensional organoiron nanostructures fixed on an inorganic matrix and study of their magnetic properties

Смирнов, В. М.; Zemtsova, E. G.; Belikov, A. A.; Zheldakov, Igor L.; Morozov, P. E.; Polyachonok, O. G.; Aleskovskii, V. B.

doi:10.1134/s0012501607040069

Cited by 9 publications

(8 citation statements)

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“…The only Fe-containing hybrid films reported so far were grown by Smirnov et al [ 11 , 116 ] from FeCl 3 and 2-propyn-1-ol (propargyl alcohol, the simplest alcohol with an alkyne group). The deposition temperature was 200 °C, but no other experimental details were given.…”

Section: Reviewmentioning

confidence: 99%

Organic and inorganic–organic thin film structures by molecular layer deposition: A review

Sundberg¹,

Karppinen²

2014

Beilstein J. Nanotechnol.

287

346

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SummaryThe possibility to deposit purely organic and hybrid inorganic–organic materials in a way parallel to the state-of-the-art gas-phase deposition method of inorganic thin films, i.e., atomic layer deposition (ALD), is currently experiencing a strongly growing interest. Like ALD in case of the inorganics, the emerging molecular layer deposition (MLD) technique for organic constituents can be employed to fabricate high-quality thin films and coatings with thickness and composition control on the molecular scale, even on complex three-dimensional structures. Moreover, by combining the two techniques, ALD and MLD, fundamentally new types of inorganic–organic hybrid materials can be produced. In this review article, we first describe the basic concepts regarding the MLD and ALD/MLD processes, followed by a comprehensive review of the various precursors and precursor pairs so far employed in these processes. Finally, we discuss the first proof-of-concept experiments in which the newly developed MLD and ALD/MLD processes are exploited to fabricate novel multilayer and nanostructure architectures by combining different inorganic, organic and hybrid material layers into on-demand designed mixtures, superlattices and nanolaminates, and employing new innovative nanotemplates or post-deposition treatments to, e.g., selectively decompose parts of the structure. Such layer-engineered and/or nanostructured hybrid materials with exciting combinations of functional properties hold great promise for high-end technological applications.

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Section: Reviewmentioning

confidence: 99%

Organic and inorganic–organic thin film structures by molecular layer deposition: A review

Sundberg¹,

Karppinen²

2014

Beilstein J. Nanotechnol.

287

346

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“…Transition metals with partly filled d orbitals and less electropositive nature prefer directional covalent bonds. Most of the ALD/MLD processes for transition metals have yielded amorphous films 17 – 21 , the only exceptions being the ALD/MLD processes for copper 7 and zirconium 22 , 23 based on Cu(thd) 2 (thd: 2,2,6,6-tetramethyl-3,5-heptanedione) plus TPA (TPA: terephthalic acid or 1,4-benzene dicarboxylic acid), ZrCl 4 plus TPA and ZrCl 4 plus 2-amino derivative of TPA. Note, however, that in the latter case an additional post-deposition treatment was required to crystallize the films.…”

Section: Introductionmentioning

confidence: 99%

Iron-Terephthalate Coordination Network Thin Films Through In-Situ Atomic/Molecular Layer Deposition

Tanskanen

Karppinen

2018

Sci Rep

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Iron terephthalate coordination network thin films can be fabricated using the state-of-the-art gas-phase atomic/molecular layer deposition (ALD/MLD) technique in a highly controlled manner. Iron is an Earth-abundant and nonhazardous transition metal, and with its rich variety of potential applications an interesting metal constituent for the inorganic-organic coordination network films. Our work underlines the role of the metal precursor used when aiming at in-situ ALD/MLD growth of crystalline inorganic-organic thin films. We obtain crystalline iron terephthalate films when FeCl3 is employed as the iron source whereas depositions based on the bulkier Fe(acac)3 precursor yield amorphous films. The chemical composition and structure of the films are investigated with GIXRD, XRR, FTIR and XPS.

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“…There are only a few preliminary studies reported on ironbased ALD/MLD hybrid thin films. [31][32][33] In two short reports 31,32 the emphasis is on the magnetic properties of the films without details of the deposition process. The precursors employed were FeCl 3 and the aliphatic propargyl alcohol (HCuC-CH 2 -OH).…”

Section: Introductionmentioning

confidence: 99%

Iron-based inorganic–organic hybrid and superlattice thin films by ALD/MLD

Tanskanen

Karppinen

2015

Dalton Trans.

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Here we present novel layer-by-layer deposition processes for the fabrication of inorganic-organic hybrid thin films of the (-Fe-O-C6H4-O-)n type and also superlattices where thicker iron oxide layers alternate with monomolecular-thin organic layers.The proc esses are based on a combi nation of at omic layer deposition ( ALD) a nd molec ular layer deposition (ML D) tec hni ques where cyclopentadienyl iron dicarbonyl dimer (Cp2Fe2(CO)4) is used as the iron source and hydroquinone (HQ) as the organic precursor. For the (-Fe-O-C6H4-O-)n hybrid films a growth rate value as high as 3.7 Å/cycle was achieved at 180 °C.Superlattices where thin crystalline iron oxide layers of the magnetite structure alternate with single organic layers consisting of benzene rings were moreover successfully fabricated from the same precursors at 160 o C using water as the source of oxygen in the ALD cycles for the magnetite layers. We foresee that our new ALD/MLD processes offer a valuable novel tool to modify the properties of magnetite thin films and even more widely possess the potential to boost the ALD/MLD research frontier on functional transition metal oxide based thin films.

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Chemical design of quasi-one-dimensional organoiron nanostructures fixed on an inorganic matrix and study of their magnetic properties

Cited by 9 publications

References 0 publications

Organic and inorganic–organic thin film structures by molecular layer deposition: A review

Organic and inorganic–organic thin film structures by molecular layer deposition: A review

Iron-Terephthalate Coordination Network Thin Films Through In-Situ Atomic/Molecular Layer Deposition

Iron-based inorganic–organic hybrid and superlattice thin films by ALD/MLD

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