2006
DOI: 10.1117/12.686732
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Chemical flare long-range proximity effects in photomask manufacturing with chemically amplified resists

Abstract: As critical dimension uniformity requirements tighten for advanced technology nodes, it becomes increasingly important to characterize and correct for systematic sources of critical dimension error in mask manufacturing. A long range proximity effect has been previously reported in the industry to occur in chemically amplified resists that appears to be related to the develop process and we call this phenomenon chemical flare. Several attempts to modulate this effect have been characterized and at least one de… Show more

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