Chemical roles of peroxide-based alkaline slurries in chemical–mechanical polishing of Ta: investigation of surface reactions using time-resolved impedance spectroscopy

Assiongbon, K.A.; Emery, S.; Pettit, C.M.; Babu, S. V.; Roy, D.

doi:10.1016/j.matchemphys.2004.03.016

Cited by 47 publications

(49 citation statements)

References 41 publications

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“…The values of R u are comparable among the different solutions, implying that the solution resistance is governed mainly by the concentration of H 2 L + , which is the same for the different solutions used. The effective double layer capacitance has the form [27][28][29]:…”

Section: Results Of Ft-eis Measurementsmentioning

confidence: 99%

Investigation of dissolution inhibitors for electrochemical mechanical planarization of copper using beta-alanine as a complexing agent

et al. 2008

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Dissolution inhibition capabilities of benzotriazole (BTAH) and ammonium dodecyl sulfate (ADS) are investigated, in combination with b-alanine, as a complexing agent for applications in electrochemical mechanical planarization (ECMP) of copper. Cu electrodissolution is induced by linear sweep voltammetry (LSV), and Fourier transform electrochemical impedance spectroscopy (FT-EIS) is combined with LSV to examine the relative roles of the electrolyte additives in governing the surface reactions of Cu under voltage activated conditions of ECMP. The experiments focus on the electrochemical rather than mechanical component of ECMP, and are designed to probe both the individual and combined effects of BTAH and ADS on Cu electro-dissolution in the absence of abrasion.

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Section: Results Of Ft-eis Measurementsmentioning

confidence: 99%

Investigation of dissolution inhibitors for electrochemical mechanical planarization of copper using beta-alanine as a complexing agent

et al. 2008

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“…This current contains a contribution of electrooxidation without anion incorporation (i ox 0 ), and one affected by anion incorporation (i ox in ) [12][13][14][15]. Based on the previously published results [12][13][14][15][16][17], the main steps of these oxidation reactions are schematically shown in Fig. 2, using the sulfate system as an example.…”

Section: Instrumentation and Proceduresmentioning

confidence: 99%

“…Electro-generation of Ta 2 O 5 is a multi-step process [8,10,16,17], where e -is the electron charge. Reactions (2) and (3) occur at the oxide-solution and the metal-oxide interfaces, respectively.…”

Section: Instrumentation and Proceduresmentioning

confidence: 99%

“…1 is i ox [16,17], with both its i ox 0 and i ox in components having the same voltage dependence according to Eq. 6.…”

Section: Instrumentation and Proceduresmentioning

confidence: 99%

“…After the first CV cycle is completed, anodically grown Ta 2 O 5 passivates the Ta surface [16][17][18], as is indicated by the drastically lowered values of i in the subsequent CV cycles. This effect of surface passivation can be quantified according to the formula [16][17][18],…”

Section: Instrumentation and Proceduresmentioning

confidence: 99%

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Electrochemical investigation of the roles of oxyanions in chemical–mechanical planarization of tantalum and tantalum nitride

et al. 2011

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Nitrate, sulfate, and phosphate oxyanions are shown to serve as effective surface-modifying agents for low-pressure chemical-mechanical planarization (CMP) of Ta and TaN barrier layers of interconnect structures. The surface reactions that form the basis of this CMP strategy are investigated using cyclic voltammetry, open circuit potential and polarization resistance measurements, and impedance spectroscopy. The results suggest that forming structurally weak layers of surface oxides is crucial to chemically controlling the CMP of Ta/TaN at low polish-pressures. It is shown that in oxyanion-based slurries, this can be accomplished by modifying the sample surfaces with anionincorporated oxide films of Ta or TaN, which, in turn, can readily be removed with moderate abrasion. Electrochemical results elaborate the reaction mechanisms that lead to anion-modified oxides, such as Ta 2 O 5(1

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Advantages of Odd Random Phase Multisine Electrochemical Impedance Measurements

Ingelgem¹,

Tourwe²,

Blajiev³

et al. 2009

Electroanalysis

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Electrochemical impedance spectroscopy (EIS) is a powerful technique to study electrochemical processes and to perform screening tasks. Recently an integrated measuring and modeling methodology for EIS based on a multisine excitation signal was developed. A key issue in this methodology is the data analysis, allowing us to rapidly quantify the reliability of the measured data. In this paper, a comparison is made between classical single-sine and the proposed multisine measurements on the same system. The fitting of the impedance data obtained by single-or multisine excitation and using different weighting factors is also discussed. In addition to the advantages reported in earlier work, it is concluded that, of all investigated frequencies, the odd random phase multisine excitation yields the highest quality data in the shortest measurement time.

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Chemical roles of peroxide-based alkaline slurries in chemical–mechanical polishing of Ta: investigation of surface reactions using time-resolved impedance spectroscopy

Cited by 47 publications

References 41 publications

Investigation of dissolution inhibitors for electrochemical mechanical planarization of copper using beta-alanine as a complexing agent

Investigation of dissolution inhibitors for electrochemical mechanical planarization of copper using beta-alanine as a complexing agent

Electrochemical investigation of the roles of oxyanions in chemical–mechanical planarization of tantalum and tantalum nitride

Advantages of Odd Random Phase Multisine Electrochemical Impedance Measurements

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