Chemical Solution Deposition of Al(OH)₃‐AlOOH Films: Application for Surface Sensitizing of Rigid and Flexible Substrates to Improve the Adhesion in Coating Technology Areas

Abstract

In this work, we present a simple and low cost formulation to obtain transparent Al(OH) 3 -AlOOH thin films by chemical solution deposition at 60°C. The deposited material was characterized by ultraviolet-visible spectroscopy, X-ray photoelectron spectroscopy, and thermogravimetric analysis. The adhesion of the obtained thin films to various rigid and flexible substrates, that include tin-free glass, polycarbonate, polymethyl methacrylate, cellulose acetate, polypropylene, polyethylene terephthalate, and polyimide, was tested. We also demonstrate here that a very thin film of Al(OH) 3 -AlOOH can act as sensitizing layer for subsequent deposition of adherent and uniform CdS thin films on a variety of substrates; therefore, a modification of the reaction conditions by an increase in cadmium salt or a decrease in reaction temperature, which are factors that promote adhesion, is then not necessary. As a further result, a general formulation to deposit films of metal hydroxides/oxyhydroxides/oxides is presented. In addition, realistic assessments of X-ray photoelectron spectroscopy and thermogravimetric analysis on Al(OH) 3 , AlOOH, and Al 2 O 3 compounds are presented for the first time.

One-Step Synthesis of ZnO Films by Chemical Bath Deposition Not Using Thermal Annealing

“…Because of its simplicity and low-cost, chemical solution deposition is a helpful technique for the synthesis of ZnO films. However, the metal oxides deposited using this technique contain a main phase of hydroxide of the metal or a proportion of it 23,24 .…”