2012
DOI: 10.1016/j.mssp.2011.06.002
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Chemical spray pyrolysis deposited fluorine-doped zinc oxide thin films: Effect of acetic acid content in the starting solution on the physical properties

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Cited by 14 publications
(4 citation statements)
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“…Several reports are available on the structural, electrical, and optical properties of FZO films. For ex-ample, Treharne and Durose [5], Nam and Kwon [6], and Castaneda et al [7] used radiofrequency magnetron sputtering, spray pyrolysis, and sol-gel spin coating, respectively, to deposit FZO thin films. Solution synthesis has become an attractive method of growing FZO thin films because it can be used to coat large areas with homogeneous films whose compositions can be easily tuned and because it is cost effective.…”
Section: Introductionmentioning
confidence: 99%
“…Several reports are available on the structural, electrical, and optical properties of FZO films. For ex-ample, Treharne and Durose [5], Nam and Kwon [6], and Castaneda et al [7] used radiofrequency magnetron sputtering, spray pyrolysis, and sol-gel spin coating, respectively, to deposit FZO thin films. Solution synthesis has become an attractive method of growing FZO thin films because it can be used to coat large areas with homogeneous films whose compositions can be easily tuned and because it is cost effective.…”
Section: Introductionmentioning
confidence: 99%
“…The influence of precursor solution and its aging time on fluorinedoped ZnO was also investigated by Guillen-Santiago et al and Anandhi et al [49,50]. Shinde et al and Castaneda et al have reported the usage of fluorine dopants to decrease the resistance of thin films [51,52]. Morphological variation from randomly distributed grains to uniformly arranged denser grains was observed on spray deposited fluorine-doped ZnO thin film [50,51].…”
Section: Introductionmentioning
confidence: 93%
“…The low cost of the equipment, the simple atomization process, and both temperature and solution flow control are the main advantages of this technique. Although it is important to highlight that, a deposition process at ambient atmosphere is a strong limiting factor in some applications requiring a clean atmosphere [11].…”
Section: Introductionmentioning
confidence: 99%