Chemical Sputtering

Jacob, W.; Roth, J.

doi:10.1007/978-3-540-44502-9_6

Cited by 51 publications

(44 citation statements)

References 278 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Such a synergistic effect, i.e., that the yield of the combined interaction of ions and neutrals hydrogen atoms is higher than the sum of the yields of the individual processes, has been found earlier by Vietzke et al for the combined bombardment of graphite with Ar + (5 keV) + H 0 [11,12] and by Davis et al for H + (50 eV to 3 keV) + H 0 [13]. Erosion due to the combined interaction of reactive neutrals and energetic ions was named chemical sputtering [5,[7][8][9][10].…”

Section: Introductionmentioning

confidence: 85%

“…[5] or [6] and references therein). Recently, Hopf et al [7][8][9][10] systematically investigated the combined interaction of argon ions and thermal hydrogen atoms with plasma-deposited amorphous hydrogenated carbon (a-C:H) films in the low-energy region (20 * Corresponding author.…”

Section: Introductionmentioning

confidence: 99%

“…A key signature of chemical sputtering is the temperature dependence of the sputtering yield [5]. Despite the large number of investigations for chemical erosion and chemical sputtering of graphite (for a review of this field see Ref.…”

Section: Introductionmentioning

confidence: 99%

“…Despite the large number of investigations for chemical erosion and chemical sputtering of graphite (for a review of this field see Ref. [5]) only a few investigations were so far devoted to a-C:H films. On the other hand, a-C:H films represent a model system for the chemical sputtering of graphite by hydrogen ions and the study of such films helps to better understand the involved basic processes.…”

Section: Introductionmentioning

confidence: 99%

“…This analytic description was developed and optimized for bombardment of graphite with energetic hydrogen ions. It is not directly applicable to erosion of a-C:H films and in particular not to the cobombardment experiments with ions and atomic hydrogen [5,[7][8][9][10].…”

Section: Introductionmentioning

confidence: 99%

See 4 more Smart Citations

Temperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen

Schlüter

Hopf

Schwarz-Selinger

et al. 2008

Journal of Nuclear Materials

View full text Add to dashboard Cite

The temperature dependence of chemical erosion and chemical sputtering of amorphous hydrogenated carbon films due to exposure to hydrogen atoms (H 0 ) alone and combined exposure to argon ions and H 0 was measured in the temperature range from 110 to 950 K. The chemical erosion yield for H 0 alone is below the detection limit for temperatures below about 340 K. It increases strongly with increasing temperature, goes through a maximum around 650 to 700 K and decreases again for higher temperatures. Combined exposure to Ar + and H 0 results in substantial chemical sputtering yields in the temperature range below 340 K. In this range the yield does not depend on temperature, but it increases with energy from about 1 (eroded carbon atoms per impinging Ar + ion) to about 4 if the ion energy is increased from 50 to 800 eV. For temperatures above 340 K the measured erosion rates show the same temperature dependence as for the H 0 -only case, but they are higher than for H 0 -only. The difference between the Ar + and H 0 and the H 0 -only cases increases monotonically with increasing ion energy.

show abstract

Section: Introductionmentioning

confidence: 85%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Temperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen

Schlüter

Hopf

Schwarz-Selinger

et al. 2008

Journal of Nuclear Materials

View full text Add to dashboard Cite

show abstract

Kinetic and potential sputtering of an anorthite‐like glassy thin film

et al. 2017

View full text Add to dashboard Cite

In this paper, we present measurements of He+ and He+2 ion‐induced sputtering of an anorthite‐like thin film at a fixed solar wind‐relevant impact energy of ~0.5 keV/amu using a quartz crystal microbalance approach (QCM) for determination of total absolute sputtering yields. He+2 ions are the most abundant multicharged ions in the solar wind, and increased sputtering by these ions in comparison to equivelocity He+ ions is expected to have the biggest effect on the overall sputtering efficiency of solar wind impact on the Moon. Our measurements indicate an almost 70% increase of the sputtering yield for doubly charged incident He ions compared to that for same velocity He+ impact (14.6 amu/ion for He+2 vs. 8.7 amu/ion for He+). Using a selective sputtering model, the new QCM results presented here, together with previously published results for Ar+q ions and SRIM results for the relevant kinetic‐sputtering yields, the effect due to multicharged‐solar‐wind‐ion impact on local near‐surface modification of lunar anorthite‐like soil is explored. It is shown that the multicharged‐solar‐wind component leads to a more pronounced and significant differentiation of depleted and enriched surface elements as well as a shortening of the timescale over which such surface‐compositional modifications might occur in astrophysical settings. In addition, to validate previous and future determinations of multicharged‐ion‐induced sputtering enhancement for those cases where the QCM approach cannot be used, relative quadrupole mass spectrometry (QMS)‐based measurements are presented for the same anorthite‐like thin film as were investigated by QCM, and their suitability and limitations for charge state‐enhanced yield measurements are discussed.

show abstract

Elimination of Biological Contaminations from Surfaces by Plasma Discharges: Chemical Sputtering

et al. 2010

View full text Add to dashboard Cite

Plasma treatment of surfaces as a sterilisation or decontamination method is a promising approach to overcome limitations of conventional techniques. The precise characterisation of the employed plasma discharges, the application of sensitive surface diagnostic methods and targeted experiments to separate the effects of different agents, have led to rapid progress in the understanding of different relevant elementary processes. This contribution provides an overview of the most relevant and recent results, which reveal the importance of chemical sputtering as one of the most important processes for the elimination of biological residuals. Selected studies on the interaction of plasmas with bacteria, proteins and polypeptides are highlighted, and investigations employing beams of atoms and ions confirming the prominent role of chemical sputtering are presented. With this knowledge, it is possible to optimize the plasma treatment for decontamination/sterilisation purposes in terms of discharge composition, density of active species and UV radiation intensity.

show abstract

Chemical Sputtering

Cited by 51 publications

References 278 publications

Temperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen

Temperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen

Kinetic and potential sputtering of an anorthite‐like glassy thin film

Elimination of Biological Contaminations from Surfaces by Plasma Discharges: Chemical Sputtering

Contact Info

Product

Resources

About