1976
DOI: 10.1016/0022-3115(76)90331-7
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Chemical sputtering of graphite by H+ ions

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Cited by 30 publications
(4 citation statements)
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“…Consequently, it has become common to refer to these low energy processes as chemical sputtering. [55][56][57] In this lower energy regime the ion beam itself constitutes a chemical reagent; chemical sputtering 58 is defined as a process in which surface molecules are ionized by chemical reactions with a hyperthermal projectile ion. The reactions can involve electron or proton (or other ion) transfer and they are strongly dependent on the chemical nature of the projectile.…”
Section: Chemical Sputteringmentioning
confidence: 99%
“…Consequently, it has become common to refer to these low energy processes as chemical sputtering. [55][56][57] In this lower energy regime the ion beam itself constitutes a chemical reagent; chemical sputtering 58 is defined as a process in which surface molecules are ionized by chemical reactions with a hyperthermal projectile ion. The reactions can involve electron or proton (or other ion) transfer and they are strongly dependent on the chemical nature of the projectile.…”
Section: Chemical Sputteringmentioning
confidence: 99%
“…FIG. 4. Temperature dependence of the sp' carbon concentration at a thin a-C:H layer exposed to thermal hydrogen calculated with Eq.…”
Section: Fig 9 Schematic Diagram Of the Reaction Steps Of The Chemica...mentioning
confidence: 99%
“…graphite [132]; (b) 200-1100 eVH + and IP on reactorgrade graphite [134],-(c) 10 keVIT^ on graphite [133]. (B) For thermal hydrogen atoms: (d) [223], (e) [129], (f) [224],…”
Section: Fig41 Comparison [132] Of the Temperature Dependence Of The ...mentioning
confidence: 99%