2011
DOI: 10.1103/physrevb.84.205217
|View full text |Cite
|
Sign up to set email alerts
|

Chemical stability of the magnetic oxide EuO directly on silicon observed by hard x-ray photoemission spectroscopy

Abstract: We present a detailed study of the electronic structure and chemical state of high-quality stoichiometric EuO and O-rich Eu 1 O 1+x thin films grown directly on silicon without any buffer layer using hard x-ray photoemission spectroscopy (HAXPES). We determine the EuO oxidation state from a consistent quantitative peak analysis of 4f valence band and 3d core-level spectra. The results prove that nearly ideal, stoichiometric, and homogeneous EuO thin films can be grown on silicon, with a uniform depth distribut… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

9
50
0

Year Published

2012
2012
2018
2018

Publication Types

Select...
5
1
1

Relationship

0
7

Authors

Journals

citations
Cited by 52 publications
(59 citation statements)
references
References 34 publications
9
50
0
Order By: Relevance
“…The major experimental difficulty relies in synthesizing the metastable oxide EuO in its stoichiometric ferromagnetic phase since off-stoichiometry precludes an epitaxial growth and also reduces ferromagnetic exchange in the ultrathin-film limit, which is, however, essential for efficient spin-filter tunneling. [13][14][15][16][17] In recent years, several growth studies on EuO thin films have been presented, in particular on stoichiometric EuO thin films grown coherently on perfectly lattice-matched yttriastabilized zirconia (YSZ) 14,18 and on different cubic oxides with only a few percent tensile lattice strain. 19,20 The system EuO/MgO (001), however, provides a large compressive lattice mismatch of m = (a MgO − a EuO )/a EuO = −18%.…”
Section: Introductionmentioning
confidence: 99%
“…The major experimental difficulty relies in synthesizing the metastable oxide EuO in its stoichiometric ferromagnetic phase since off-stoichiometry precludes an epitaxial growth and also reduces ferromagnetic exchange in the ultrathin-film limit, which is, however, essential for efficient spin-filter tunneling. [13][14][15][16][17] In recent years, several growth studies on EuO thin films have been presented, in particular on stoichiometric EuO thin films grown coherently on perfectly lattice-matched yttriastabilized zirconia (YSZ) 14,18 and on different cubic oxides with only a few percent tensile lattice strain. 19,20 The system EuO/MgO (001), however, provides a large compressive lattice mismatch of m = (a MgO − a EuO )/a EuO = −18%.…”
Section: Introductionmentioning
confidence: 99%
“…Being doped, though, at high temperature, these materials typically enter into dominant states that are not spatially homogeneous due to formation of magnetic polarons -few-body systems comprised of electron and local magnetic moments of the host [20,[24][25][26][27]. However, this unwanted formation does not take place when magnetisation of the lattice is significant, leaving the host material perfectly homogeneous in the region of its employment as a spin injector [25][26][27].Owing its outstanding magnetic and transport properties among other MS, EuO has recently attracted much attention as having tremendous potential for semiconductor spintronics, in particular, when integrated with Si [18,[28][29][30]. Not only does doped EuO exhibit a spin polarization close to 100% due to enormous (~0.6 eV) spin splitting of its conduction band but also it can be conductance-matched with Si by doping with oxygen vacancies or trivalent rare-earth atoms such as Gd, La or Lu [18,[30][31][32][33].…”
mentioning
confidence: 99%
“…An intermediate layer, however, reduces the probability of spin-polarized carriers injection exponentially. In particular, an enormous band gap of about 6 eV in SrO makes injection of spin-polarized carriers into Si rather ineffective.The continuing attempts to grow EuO/Si heterojunctions [28][29][30]43,44] are checked by the presence of large amounts of impurity phases at the interface. These phases are not only detrimental to the growth of EuO films; they also prevent spin injection due to spin-flip scattering.…”
mentioning
confidence: 99%
See 2 more Smart Citations