Chemical treatment effect of Si(111) surfaces in F-based aqueous solutions

Adachi, Sadao; Arai, Takehiko; Kobayashi, Kazuyuki

doi:10.1063/1.362729

Cited by 64 publications

(31 citation statements)

References 27 publications

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“…Improvement in the hydrophobicity of the films is obvious. Usually, a hydrophilic surface has a surface contact angle less than 70°, and a hydrophobic surface is characterized by a surface contact angle of 70° or greater 30) . These results indicate that the S-DLC films became more hydrophobic with sulfur incorporation, resulting in a surface with low wetting and sticking tendencies.…”

Section: Surface Contact Anglementioning

confidence: 99%

Study on the Correlation between Surface Properties and Tribological Performance of S-DLC Films

Moolsradoo

Watanabe

2012

Journal of The Surface Finishing Society of Japan

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Section: Surface Contact Anglementioning

confidence: 99%

Study on the Correlation between Surface Properties and Tribological Performance of S-DLC Films

Moolsradoo

Watanabe

2012

Journal of The Surface Finishing Society of Japan

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“…SE is a highly surface-sensitive technique which enables detection of not only submonolayer coverage of a surface by adsorbed species 28,29 but also the surface roughness of its size smaller than the wavelength of light. 30 An ambient-type AFM does not require special care in sample preparation but has sufficient resolution for evaluating atomic-scale roughness.…”

Section: Introductionmentioning

confidence: 99%

Properties of GaP(001) surfaces chemically treated in NH4OH solution

Morota

Adachi

2006

Journal of Applied Physics

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Chemically cleaned GaP͑001͒ surfaces in 25% NH 4 OH solution have been studied using spectroscopic ellipsometry ͑SE͒, ex situ atomic force microscopy ͑AFM͒, x-ray photoelectron spectroscopy ͑XPS͒, and wettability measurement techniques. The SE data clearly indicate that the solution causes removal of the native oxide film immediately upon immersing the sample. The SE data also indicate that when the native oxide film is completely etch removed, the resulting surface is still roughened. The estimated roughness thickness is ϳ1.2 nm, in excellent agreement with the AFM rms value ͑ϳ1.2 nm͒. The XPS spectra confirm the removal of the native oxide from the GaP surface. The XPS data also suggest a thin oxide overlayer, ϳ0.3 nm thick, on the etch-cleaned GaP surface. The wettability measurements indicate that the as-degreased surface is hydrophobic, while the NH 4 OH-cleaned surface is hydrophilic. This result is in direct contrast to those obtained from acid cleaned surfaces, which are usually hydrophobic. The origin of hydrophilicity may be singular and associated hydroxyl groups bonded on the GaP surface.

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“…Table 2 demonstrates that with N, F and C incorporation in the films, the contact angle with ethylene glycol and methylene iodide for the as-deposited silicon nitride films are about 26.2-47.11 and 40.7-48.31, respectively. Usually, a hydrophilic surface has a contact angle less than 701, and a hydrophobic surface are characterized by a contact angle of 701 or above (Adachi et al, 1996). These results indicate that the as-deposited Si-N films are hydrophilic and lipophilic (amphipathic nature).…”

Section: Wetting Behavior and Surface Free Energymentioning

confidence: 81%