Chemical vapor deposition growth and properties of TaCxNy

Engbrecht, E. R.; Sun, Yiyong; Smith, Stephen D.; Pfiefer, K; Bennett, Joe; White, John; Ekerdt, John G.

doi:10.1016/s0040-6090(02)00724-1

Cited by 35 publications

(22 citation statements)

References 11 publications

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“…This result indicated that the surface of the Ta-CN was composed of Ta-CN and Ta 2 O 5 . In addition, the peaks attributed to TaN (397.6 eV) [24] and to TaC (282.6 eV) [24] were observed in the N 1 s and C 1 s spectrum of the Ta-CN, respectively. Although the XRD pattern of the Ta-CN had only TaC x N y peaks, the surface of the Ta-CN powder was partially oxidized in air and/or oxygen molecules adsorbed on the surface.…”

Section: Surface Propertiesmentioning

confidence: 94%

Tantalum oxide-based compounds as new non-noble cathodes for polymer electrolyte fuel cell

Ishihara

Tamura

Matsuzawa

et al. 2010

Electrochimica Acta

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Section: Surface Propertiesmentioning

confidence: 94%

Tantalum oxide-based compounds as new non-noble cathodes for polymer electrolyte fuel cell

Ishihara

Tamura

Matsuzawa

et al. 2010

Electrochimica Acta

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“…This result indicated that the surface of the TaC x N y was composed of TaC x N y and Ta 2 O 5 . In addition, the peaks attributed to TaN (397.6 eV) [47] and to TaC (282.6 eV) [47] were observed in the N 1s and C 1s spectra of the TaC 0.52 N 0.48 , respectively. Although the XRD pattern of the TaC 0.52 N 0.48 had only TaC x N y peaks, the surface of the TaC 0.52 N 0.48 powder was partially oxidized in air.…”

Section: Characterization Of the Specimensmentioning

confidence: 94%

Development of group 4 and 5 metal oxide-based cathodes for polymer electrolyte fuel cell

Ota

Ohgi

Nam

et al. 2011

Journal of Power Sources

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“…Tantalum nitride and tantalum carbide films can be fabricated by various approaches, such as reactive sputtering [5], chemical vapor deposition [6], pulsed laser deposition [7], and ion beam-assisted deposition [8]. It has been found that the structure and properties of tantalum nitride and tantalum carbide films are dependent on deposition parameters and technology.…”

Section: Introductionmentioning

confidence: 99%

Phase evolution of tantalum nitride and tantalum carbide films with PBII parameters

Tang

et al. 2011

Rare Metals

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Tantalum nitride and tantalum carbide films were fabricated using magnetron sputtering of tantalum followed by nitrogen and carbon plasma-based ion implantation (N-PBII and C-PBII). The phase evolution and morphology of the films were studied using glancing angle X-ray diffraction (GXRD) and transmission electron microscopy (TEM). It was found that the main phase in the tantalum nitride films was crystalline TaN 0.1 whose grain size increases with increasing implantation voltage and phase content increases with increasing implantation dose. In the tantalum carbide film, the main phase was Ta 2 C. TaC phase also appeared as the implantation dose increased. XRD results from various glancing angles show that the phases with high nitrogen or carbon content, Ta 4 N 5 and TaC, are present in the surface of the films. X-ray photoelectron spectra (XPS) from the tantalum carbide film reveal that the surface carbon content is higher than that of the inner film.

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Chemical vapor deposition growth and properties of TaCxNy

Cited by 35 publications

References 11 publications

Tantalum oxide-based compounds as new non-noble cathodes for polymer electrolyte fuel cell

Tantalum oxide-based compounds as new non-noble cathodes for polymer electrolyte fuel cell

Development of group 4 and 5 metal oxide-based cathodes for polymer electrolyte fuel cell

Phase evolution of tantalum nitride and tantalum carbide films with PBII parameters

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