1988
DOI: 10.1063/1.100558
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Chemical vapor deposition of cobalt silicide

Abstract: We have deposited polycrystalline cobalt silicide films by chemical vapor deposition using Co2(CO)8 or HCo(CO)4 as the Co source and SiH4 or Si2H6 as the Si source. The Co:Si ratio of the films is controlled by changing the deposition temperature, and CoSi2 stoichiometry is obtained at 300 °C using SiH4 or at 225 °C when Si2H6 is the Si precursor. Carbon or oxygen contamination of the films is <0.5 at. % at deposition temperatures above 200 °C. Resistivities of films deposited near CoSi2 stoichiometry a… Show more

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Cited by 31 publications
(31 citation statements)
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“…IIIB2͒, this still requires a temperature of about 60°C. 141 This temperature was not reached for the parasitic deposits nor for the primary deposits ͑judging from the absence of anomalously high growth rates such as in Fig. 15͒.…”
Section: Composition and Resistivitymentioning
confidence: 99%
“…IIIB2͒, this still requires a temperature of about 60°C. 141 This temperature was not reached for the parasitic deposits nor for the primary deposits ͑judging from the absence of anomalously high growth rates such as in Fig. 15͒.…”
Section: Composition and Resistivitymentioning
confidence: 99%
“…Synthesis and structures of [1][2][3][4][5][6] Three new cobalt pyrazolate complexes were synthesized using either standard salt elimination routes from cobalt halides and the sodium or lithium salt of 3,5-(CF 3 ) 2 -Pz or by oxidative addition of the N-H bond of the parent pyrazole (3, ) 2 -PzH) to the highly reactive zero-valent Co complex Co(PMe 3 ) 4 (Scheme 1). The use of n-BuLi to generate the pyrazolate lithium salt was the first route explored.…”
Section: Resultsmentioning
confidence: 99%
“…[(PMe 3 )Co(μ-3,5-(CF 3 ) 2 -Pz) 2 (μ 3 -OH)Li] 2 (5). In order to investigate the interactions of these Co pyrazolate complexes with other oxygen containing species we investigated the reaction of (3) showing the atom numbering scheme.…”
Section: Paper Dalton Transactionsmentioning
confidence: 99%
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