The chemical vapor deposition (CVD) of crystalline thin films of neodymium hexaboride (NdB 6 ) was achieved using either nido-pentaborane(9) or nido-decaborane(14) with neodymium(III) chloride on different substrates. The highly crystalline NdB 6 films were formed at relatively moderate temperatures (835• C, ca. 1 µm/h) and were characterized by scanning electron microscopy, X-ray emission spectroscopy, X-ray diffraction and glow discharge mass spectrometry. The NdB 6 polycrystalline films were found to be pure and uniform in composition in the bulk material. Depositions using CoCl 2 , NdCl 3 and B 5 H 9 as the CVD precursors resulted in the formation of a mixture of NdB 6 and CoB phases, rather than the ternary phase.