Chemical vapor deposition of the superconducting YBa2Cu3O7−<i>x</i> phase using halides as metal sources

Ottosson, Mikael; Andersson, Tomas; Carlsson, Jan‐Otto; Hårsta, Anders; Jansson, Ulf; Norling, P.; Niskanen, K.; Nordblad, Per

doi:10.1063/1.101540

Cited by 43 publications

(9 citation statements)

References 5 publications

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“…Figure 1 shows the ͑4,0͒ band of the ͓10.3͔ 3 ⌽ 4 -X 3 ⌽ 4 transition. The first lines, P(5), Q (4), and R(4) of the branches, are clearly resolved and assigned, which confirmed the transition observed belongs to a ⍀Јϭ⍀Љϭ4 transition. With strong P and R branches, the transition has been assigned as a 3 ⌽ 4 -X 3 ⌽ 4 transition.…”

Section: Resultssupporting

confidence: 69%

See 1 more Smart Citation

Rotational and hyperfine analysis of the near infrared Φ43–X 3Φ4 transitions of CoCl and CoI

Wong

Tam

Cheung

2003

The Journal of Chemical Physics

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Articles you may be interested inHyperfine interactions in the A 3Φ4 and X 3Φ4 states of iridium monofluoride, IrF J. Chem. Phys. 135, 034305 (2011); 10.1063/1.3609100 The rotational spectrum of CoF in all three spin-orbit components of the X Φ i 3 state High-resolution spectroscopy of CoS ( X Δ i 4 ) : Examining 3 d transition-metal sulfide bonds J. Chem. Phys. 123, 164312 (2005); 10.1063/1.2083507 Perturbations in the pure rotational spectrum of CoCl (X 3 Φ i ): A submillimeter studyElectronic transitions of cobalt monochloride and cobalt monoiodide have been studied using laser vaporization-reaction free jet expansion and laser induced fluorescence spectroscopy in the near infrared region. The observed transitions have been identified as the ͓10.3͔ 3 ⌽ 4 -X 3 ⌽ 4 transition of CoCl and ͓11.0͔ 3 ⌽ 4 -X 3 ⌽ 4 transition of CoI. The magnetic hyperfine structure arising from the cobalt nucleus with Iϭ7/2 was resolved and analyzed. Accurate rotational and hyperfine parameters for the ͓10.3͔ 3 ⌽ 4 and X 3 ⌽ 4 states of CoCl and ͓11.0͔ 3 ⌽ 4 and X 3 ⌽ 4 states of CoI have been obtained. Comparison of Fermi contact parameters, b F , for the upper states indicated that the observed ͓10.3͔ 3 ⌽ 4 -X 3 ⌽ 4 transition of CoCl and ͓11.0͔ 3 ⌽ 4 -X 3 ⌽ 4 transition of CoI have arisen from the promotion of an electron from the bonding orbital to a slightly antibonding orbital. Observed low-lying 3 ⌽ states of the cobalt monohalides and hydride are also compared and discussed.

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Section: Resultssupporting

confidence: 69%

“…[2][3][4] Spectroscopic studies of transition metal diatomic halides have been an active area of research for many years. [5][6][7][8] The diatomic metal monohalides are simple model systems that can provide insight into the role of the d orbitals in chemical bonding.…”

Section: Introductionmentioning

confidence: 99%

Rotational and hyperfine analysis of the near infrared Φ43–X 3Φ4 transitions of CoCl and CoI

Wong

Tam

Cheung

2003

The Journal of Chemical Physics

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“…[20±22] In CE-CVD, yttrium oxide depositions can be carried out at 315±360 C, [20] when thermal CVD of Y 2 O 3 is efficient at 700 C and above. [20] In these CVD processes Y(thd) 3 is the preferred precursor, although some other b-diketonate complexes [23] and YCl 3 [24,25] have occasionally been used. In some cases, unstable Y(thd) 3 vapor pressure has been observed when prolonged heating or reheating has been applied.…”

Section: Introductionmentioning

confidence: 99%

Low-Temperature ALE Deposition of Y2O3 Thin Films from β-Diketonate Precursors

Putkonen

Sajavaara

Johansson³

et al. 2001

Chem. Vap. Deposition

112

106

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Yttrium oxide thin film deposition by atomic layer epitaxy (ALE) was studied at 200±425 C using Y(thd) 3 , Y(thd) 3 (bipyridyl), or Y(thd) 3 (1,10-phenanthroline) (thd = 2,2,6,6-tetramethyl-3,5-heptanedione) as an yttrium precursor, and ozone as an oxygen source. All yttrium precursors were analyzed by thermogravimetry/differential thermal analysis (TG-DTA) and mass spectrometry (MS). Soda lime glass and Si(100) were used as substrates. With all precursors, a constant deposition rate of 0.22±0.23 (cycle) ±1 was observed at 250±350 C on both substrates, indicating a surface-controlled growth and similar surface species at the deposition temperatures used. The effect of growth parameters, such as reactant pulsing times, was investigated in detail at 350 C using Y(thd) 3 . Deposited films were characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM) in order to determine crystallinity and surface morphology, while ion-beam analysis and X-ray photoelectron spectroscopy (XPS) were used to analyze stoichiometry and impurity levels. Infrared (IR) measurements were performed to determine the type of carbon impurity. Crystalline films with a (400) dominant orientation were obtained when depositions were carried out within the ALE window (temperature range of 250±375 C), but films deposited below 250 C were nearly amorphous. Preferential orientation changed from (400) to (222) when deposition temperatures were raised slightly above the ALE window to 375 C, where a partial decomposition of Y(thd) 3 probably takes place. Judging from the impurity levels of the films and growth rates, the adducting of Y(thd) 3 does not bring about any advantages in the ALE growth of Y 2 O 3 .

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“…For halide CVD of the YBa2Cu307_ x phase a mixture of chlorides and iodides was used as source materials [8]. For halide CVD of the YBa2Cu307_ x phase a mixture of chlorides and iodides was used as source materials [8].…”

Section: Comparison With Experimentsmentioning

confidence: 99%

“…The YBa2Cu307_ x phase has been deposited using a mixture of chlorides and iodides (YC13, BaI2 and CuI) as metal precursors [8]. The YBa2Cu307_ x phase has been deposited using a mixture of chlorides and iodides (YC13, BaI2 and CuI) as metal precursors [8].…”

Section: Introductionmentioning

confidence: 99%

Thermodynamic modelling of CVD of high-T c superconductors

Hårsta

1997

Journal of Thermal Analysis

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Thermodynamic modelling of CVD of the superconducting phases in the Y-Ba--Cu--O and Bi-Sr-Ca-Cu-O systems is reviewed. Both MOCVD and halide CVD are considered. The resuits are discussed in terms of calculated CVD stability diagrams. The influence of deposition parameters, including selection of precursors, on the existence and extension on those stability regions, where the superconducting phases can be deposited, is described. The results of the thermodynamic modelling are compared with experimental investigations. The agreement between thermodynamics and experiments is satisfactory, indicating that thermodynamic modelling can be used as a guide to predict the optimum deposition conditions.

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Chemical vapor deposition of the superconducting YBa2Cu3O7−x phase using halides as metal sources

Cited by 43 publications

References 5 publications

Rotational and hyperfine analysis of the near infrared Φ43–X 3Φ4 transitions of CoCl and CoI

Rotational and hyperfine analysis of the near infrared Φ43–X 3Φ4 transitions of CoCl and CoI

Low-Temperature ALE Deposition of Y2O3 Thin Films from β-Diketonate Precursors

Thermodynamic modelling of CVD of high-T c superconductors

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