Chemical vapor deposition of ZrC within a spouted bed by bromide process

Ogawa, Teiichiro; Ikawa, Katsuichi; Iwamoto, Kazumi

doi:10.1016/0022-3115(81)90423-2

Cited by 54 publications

(27 citation statements)

References 10 publications

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“…The grain size of ZrC grows larger compared with that at or over 1573 K. As for the morphologies of deposited carbon, they showed column growth at 1573 K and isotropic forms at temperatures higher than 1673 K, 4,22 which coincide with the morphologies of ZrC films at 1573 K and 1673 K. Our assumption is further supported by the CVD deposition practice in a previous study, in which the growth rates of ZrC films were determined by the carbon deposition rate. 14 Consequently, a deposition model for ZrCl 4 -CH 4 -H 2 system is being proposed on the basis of the carbon deposition process. During the deposition of carbon on a substrate, the gaseous hydrocarbon is generally decomposed to form a liquid or plastic droplet of complex organic materials, and then the droplets impinge on the substrate surface.…”

Section: Resultsmentioning

confidence: 99%

“…It therefore is the most investigated deposition method for the preparation of ZrC coatings. The CVD processes-including chloride, 10-13 bromide, 14,15 and iodide 16 processes-have previously been examined. The various parameters such as temperature, deposition pressure, carbon source, and flux of gas precursors, have also been heavily investigated.…”

Section: Introductionmentioning

confidence: 99%

“…ZrC coatings have been grown by electron-beam bombardment, 6 laser cladding, 7 pulsed laser ablation-deposition, 8 magnetron sputter deposition, 9 and chemical vapor deposition (CVD). [10][11][12][13][14][15][16] Among these methods, CVD has advantages over the others in that it could be used to uniformly coat not only flat surfaces, but also complex-shaped components like particles and cutting tools. It therefore is the most investigated deposition method for the preparation of ZrC coatings.…”

Section: Introductionmentioning

confidence: 99%

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Morphologies and growth mechanisms of zirconium carbide films by chemical vapor deposition

et al. 2008

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Zirconium carbide films were grown on graphite slices by chemical vapor deposition using methane, zirconium tetrachloride, and hydrogen as precursors. The growth rate of zirconium carbide films as a function of temperature was investigated. The morphologies of these films at different temperatures were also observed by scanning electron microscopy. The results indicated that the deposition of zirconium carbide was dominated by gas nucleation at temperatures below 1523 K, and by surface process at temperatures higher than 1523 K. By comparison of the deposition activation energies for zirconium carbide and deposited carbon, it was determined that the carbon deposition was the controlled process during the growing of zirconium carbide films. The effect of temperatures on the morphologies of zirconium carbide films was also discussed, based on the carbon deposition process.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Morphologies and growth mechanisms of zirconium carbide films by chemical vapor deposition

et al. 2008

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“…Several studies reported the CVD of zirconium carbide and carbon-zirconium carbide alloys [10][11][12][13][14][15][16][17][18]. The ZrC coatings are generally synthesized by zirconium halide [11,12] and hydrocarbons, such as CH 4 and C 3 H 6 [14,15].…”

Section: Introductionmentioning

confidence: 99%

Calculation and synthesis of ZrC by CVD from ZrCl4–C3H6–H2–Ar system with high H2 percentage

Zhu

Cheng

et al. 2015

Applied Surface Science

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“…In the studies performed in early 1970–1980s at ex‐JAEA (Japan Atomic Energy Research Institute), ZrC‐coating conditions 4 for obtaining uniform structures and stoichiometry were successfully acquired using a small‐scale, a few tens of gram per batch, coater method. However, to date, only a few transmission electron microscope (TEM) observation data of the ZrC layer have been obtained 5 …”

Section: Introductionmentioning

confidence: 99%

TEM/STEM Observation of ZrC‐Coating Layer for Advanced High‐Temperature Gas‐Cooled Reactor Fuel

Aihara

Ueta

Yasuda

et al. 2007

Journal of the American Ceramic Society

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The Japan Atomic Energy Agency (JAEA) has started to study and develop ZrC‐coated fuel particles for advanced high‐temperature gas‐cooled reactors. The ZrC‐coating layer was fabricated using the bromide process at JAEA. In the early stage of the project, however, the deposition temperature was varied. This paper mainly focuses on the microstructures of the ZrC‐coating layer developed in the early stage of the project. Some circumferential stripes were observed in the ZrC‐coating layer on optical micrographs. It was found that the stripes were caused by the nonuniform distribution of the free carbon phase. It was also revealed by means of transmission electron microscope /scanning transmission electron microscope observations that crystal grains of the ZrC were small and columner in shape, and were not equiaxed especially near the surface. It appears that the oscillated deposition temperature results in the nonuniform distribution of the free carbon region. The structure of the free carbon region formed in the ZrC‐coating layer appeared to be such that the c‐plane was roughly parallel to its lengthened direction. The ZrC‐coating layer appeared to be bound to the PyC layer. Fibrous carbon existing at the PyC/ZrC boundary was also observed.

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Chemical vapor deposition of ZrC within a spouted bed by bromide process

Cited by 54 publications

References 10 publications

Morphologies and growth mechanisms of zirconium carbide films by chemical vapor deposition

Morphologies and growth mechanisms of zirconium carbide films by chemical vapor deposition

Calculation and synthesis of ZrC by CVD from ZrCl4–C3H6–H2–Ar system with high H2 percentage

TEM/STEM Observation of ZrC‐Coating Layer for Advanced High‐Temperature Gas‐Cooled Reactor Fuel

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