were varied to establish their influence on the microstructure of the LZO layers. XRD and TEM were used for sample characterisation. The epitaxial pyrochlore phase was obtained for annealing temperatures higher that 850°C whatever the other annealing conditions. However, the film microstructure, in particular, nanovoids shape and size, is strongly dependent on heating ramp and pressure during annealing. When using low heating ramp, percolation of voids creates diffusion channels for oxygen which are detrimental for the substrate protection during coated conductor fabrication. From this point of view high heating rates are more adapted to the growth of LZO layers.