2002
DOI: 10.1002/1521-396x(200206)191:2<499::aid-pssa499>3.0.co;2-i
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Chemically Sprayed Fluorine-Doped Zinc Oxide Thin Films Deposited from Zn(C5H7O2)2: Effect of the Molarity and Substrate Temperature on the Physical Properties

Abstract: Fluorine-doped zinc oxide thin films, ZnO : F, were deposited by the chemical spray pyrolysis technique using zinc acetylacetonate, Zn(C 5 H 7 O 2 ) 2 , and ammonium fluoride as precursors. The molar concentration in the starting solution and the substrate temperature, T s , were varied in order to obtain transparent and conductive films. For molarities higher than 0.3 M, growth rate values on the order of 3.5 nm/s were obtained. As the molarity increases, the resistivity r decreases up to a minimum value in t… Show more

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Cited by 5 publications
(4 citation statements)
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“…The growth rate of the oxide is linked with the concentration of the precursor: it increases linearly with the concentration up to a limit where it saturates. This has been verified at least for In 2 O 3 and ZnO for different precursors [4,5]. This suggests that at low concentration, mass transport governs the growth rate while for higher concentration the diffusion of the reactants on the surface become the limiting mechanism.…”
Section: Spray Pyrolysis For Oxide Film Formationmentioning
confidence: 68%
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“…The growth rate of the oxide is linked with the concentration of the precursor: it increases linearly with the concentration up to a limit where it saturates. This has been verified at least for In 2 O 3 and ZnO for different precursors [4,5]. This suggests that at low concentration, mass transport governs the growth rate while for higher concentration the diffusion of the reactants on the surface become the limiting mechanism.…”
Section: Spray Pyrolysis For Oxide Film Formationmentioning
confidence: 68%
“…This parameter is especially important when highly organized and crystallized films are expected, as is the case for HTS films. As was recalled for In 2 O 3 and ZnO [4,5], a high concentration of precursor makes the limiting step of the deposition rate to be surface diffusion. This is propitious for the formation of highly textured or epitaxial films and applies very well to the case of YBCO films.…”
Section: The Concentration Of the Solutionmentioning
confidence: 96%
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