Chemischer Informationsdienst
 1986
DOI: 10.1002/chin.198615034
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ChemInform Abstract: Characterization of Oxide Growth at High Temperatures and Low Pressures from Silane/Nitrous Oxide Reaction.

Arthur J. Learn1,
R. B. Jackson2

Abstract: The growth of silicon‐rich and stoichiometric oxide from silane and nitrous oxide by low pressure chemical vapor deposition in a vertical‐flow reactor has been examined.

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