“…In addition to these methods, the simplest and the most convenient method is chemical deposition, which has been used to prepare a large number of semiconductor thin films such as PbS (1)(2)(3)(4)(5), PbSe (6), CdS (7), CdSe (6,8), ZnSe (9), Cdi =Pb=Se (10), Pb~_fl-IgxS (10,11), CdL_=Zn~S (10), and CdI_=Hg=S (11). For epitaxial growth, vapor phase epitaxy (VPE), molecular beam epitaxy (MBE), hot wall epitaxy (HWE), and metallorganic chemical vapor deposition (MOCVD) techniques have been used.…”