Chemischer Informationsdienst
 1982
DOI: 10.1002/chin.198214019
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ChemInform Abstract: SURFACE CHARACTERIZATION OF PHOTODEPOSITED SILICON/GERMANIUM ALLOY FILMS

Gilbert J. Mains1,
Jürgen Schreiner2,
T. H. Fleisch3

Abstract: 3P, ‐Hg‐photosensibilisierte UV‐Bestrahlung von GeH4 /SiH4 ‐Gasgemischen führt auf Glas‐, Glimmer‐ und Edelstahlsubstraten zu Abscheidung von H‐haltigen Si/Ge‐Legierungsfilmen, die durch XPS oder E‐SCA untersucht werden.

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