1971
DOI: 10.1021/ar50039a003
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Chemistry of trichlorosilane-tertiary amine combinations

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Cited by 129 publications
(59 citation statements)
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References 52 publications
(16 reference statements)
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“…The disadvantage of this process is the extreme reaction conditions. Utilising Benkeser reaction [44][45][46], a similar moiety (R 2 PSiCl 3 ) can be easily prepared with high yield at normal reaction conditions (Eq. (2.3)).…”
Section: Dialkylchalcogenophosphatesmentioning
confidence: 99%
“…The disadvantage of this process is the extreme reaction conditions. Utilising Benkeser reaction [44][45][46], a similar moiety (R 2 PSiCl 3 ) can be easily prepared with high yield at normal reaction conditions (Eq. (2.3)).…”
Section: Dialkylchalcogenophosphatesmentioning
confidence: 99%
“…As a synthetic alternative to ''free'' SiCl 2 , the trichlorosilylation of related organic chlorides with HSiCl 3 in presence of amines (Benkeser reaction) [6] or halide ions [7] has made available a number of alkyltrichlorosilanes and bis-trichlorosilanes. By use of trimethylsilyltriflate as starting material, the HSiCl 3 /NEt 3 reagent has also been applied for Si-Si-bond formation [8].…”
Section: Dichlorosilylene Equivalentsmentioning
confidence: 99%
“…The prep aration of bis(trichlorosilyl)methane by the reac tion of trichlorom ethane with trichlorosilane and a tertiary amine base [27] can be notably improved by replacing the trichlorom ethane with chloromethyltrichlorosilane or dichlormethyltrichlorosilane. The photo-chlorination of bis(trichlorosilyl)methane in CC14 solution is slow but proceeds with out side reactions, and the copper reduction of dichloro-bis(trichlorosilyl)methane at 160-190 °C affords 15 in 64% yield.…”
Section: Preparation O F C-halogenated Trichlorosilylethenesmentioning
confidence: 99%