To
gain full control over the growth of carbon nanotubes (CNTs)
using plasma-enhanced chemical vapor deposition (PECVD), a thorough
understanding of the underlying plasma-catalyst mechanisms is required.
Oxygen-containing species are often used as or added to the growth
precursor gas, but these species also yield various radicals and ions,
which may simultaneously etch the CNT during the growth. At present,
the effect of these reactive species on the growth onset has not yet
been thoroughly investigated. We here report on the etching mechanism
of incipient CNT structures from OH and O radicals as derived from
combined (reactive) molecular dynamics (MD) and force-bias Monte Carlo
(tfMC) simulations. Our results indicate that the oxygen-containing
radicals initiate a dissociation process. In particular, we show how
the oxygen species weaken the interaction between the CNT and the
nanocluster. As a result of this weakened interaction, the CNT closes
off and dissociates from the cluster in the form of a fullerene. Beyond
the specific systems studied in this work, these results are generically
important in the context of PECVD-based growth of CNTs using oxygen-containing
precursors.