Chlorine and oxygen evolution on various compositions of RuO2/TiO2 electrodes

Burrows, I.R.; Denton, D. A.; Harrison, J.A.

doi:10.1016/0013-4686(78)85026-9

Cited by 50 publications

(24 citation statements)

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“…In addition, increasing the operating current density promoted the generation of active chlorine from the electrochemical oxidation of Cl À (Burrows et al, 1978;Evdokimov and Gorodetskii, 1986). This fact indicated that the enhancement of MC removal due to the increasing current density was contributed by the indirect oxidation effect of active chlorine transformed from Cl À during electrolyzing.…”

Section: à2mentioning

confidence: 99%

Degradation of microcystins in aqueous solution with in situ electrogenerated active chlorine

Shi

Wang

et al. 2005

Chemosphere

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A new and efficient method for the degradation of microcystins (one family of blue algal toxins) was developed and studied. Microcystins (MCs) in water were directly and effectively removed by active chlorine transformed in situ from the naturally existing Cl À in water resource using electrochemical method. , 20°C and pH 7.00. The qualitative analysis showed that the heptapetide ring and the Adda group of both treated MCs were changed. The results also indicated that the removal rates of both MCs increased with the increasing of chloride concentration and applied current density, but decreased with the increasing of initial concentration of MCs and initial pH of electrolyte. In the absence of Cl À , only a small fraction of both MCs were decomposed by direct anodic oxidation, while their almost complete removals could be obtained in the case of indirect electrooxidation with in situ electrogenerated active chlorine from Cl À in water.

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Section: à2mentioning

confidence: 99%

Degradation of microcystins in aqueous solution with in situ electrogenerated active chlorine

Shi

Wang

et al. 2005

Chemosphere

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“…This model has been criticized on the basis of the energetically unlikely oxidation of C1-to Clad + (envisioned as hypochlorous acid or some derivative thereof) enroute to C1 ~ (i.e., CI~), and the abnormal value (a = 1) of the transfer coefficient (21). The viewpoint of Harrison and coworkers regarding the mechanism of C12 evolution has undergone a metamorphosis not unlike that of the l~renburg-Krishtalik group (33)(34)(35)(36). The reaction order was measured over a chloride ion concentration ot~0.5-5M (pH ~ 2, ionic strength not constant).…”

Section: Ion Implantation and Electrocatalysis--electrocataly-mentioning

confidence: 99%

Application of Ion Implantation to the Study of Electrocatalysis: I . Chlorine Evolution at Ru‐Implanted Titanium Electrodes

Kelly

Heatherly

Vallet

et al. 1987

J. Electrochem. Soc.

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Ru-implanted titanium near-surface alloys were generated by ion implantation, characterized (Ru concentration/ depth profiles) by Rutherford backscattering, and subsequently anodically oxidized to form electrocatalytically active RuxTil_xOJTi electrodes. The electrochemical behavior of the metallic-like electrodes was investigated in acidic chloride, perchlorate, and sulfate media. A correlation between the rate of the C12 evolution reaction and the Ru-implant profiles established that the reaction is first order in the concentration of Ru(IV) in the oxide at the oxide/solution interface, and enabled an in situ evaluation of the latter quantity. The Tafel slope for the C12 evolution reaction is 40 mV, i.e., o E/O log i = 2.303 (2RT/3F). The reaction order with respect to chloride ion concentration, 0 log i/0 log [C1-], approaches 1.0 and 2.0 at high and low chloride Concentrations, respectively. A modified Volmer-Heyrovsky mechanism, one in which the role of adsorbed chloride ions is taken into account, is shown to be consistent with the aforementioned diagnostic parameters.ion implantation, a nonequilibrium doping technique, enables the controlled introduction of virtually any element into the near-surface region of any substrate, typically to a depth up to a few hundred nanometers. The concentration/depth profile of the implanted species (determined, for example, by Rutherford backscattering) *Electrochemical Society Active Member. may be tailored over a wide range by varying the energy of the incident ions and the number of ions (coulombs of charge) implanted at each energy. As a surface modification technique, ion implantation has found widespread application for improving the electronic, optical, tribological, and corrosion characteristics of materials (1-4). The rates of many technologically important electrochemical charge transfer reactions occurring at elec-) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 128.255.6.125 Downloaded on 2015-06-03 to IP

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“…The mechanism leading to the deactivation of these electrodes has been widely investigated and can be summarized in the following steps: (i) electrode passivation promoted by the insulating TiO 2 layer formed between the metallic Ti-base and the conducting oxide layer [3], and (ii) partial removal of the loaded catalyst (RuO 2 ) due to erosion and corrosion processes [4][5][6]. The occurrence of both processes (i) and (ii), which play different roles depending on the electrode composition and the method employed for its preparation, has also been claimed [7][8][9].…”

Section: Introductionmentioning

confidence: 99%

Investigation of the electrical properties, charging process, and passivation of RuO2–Ta2O5 oxide films

Ribeiro

Andrade

2006

Journal of Electroanalytical Chemistry

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Chlorine and oxygen evolution on various compositions of RuO2/TiO2 electrodes

Cited by 50 publications

References 3 publications

Degradation of microcystins in aqueous solution with in situ electrogenerated active chlorine

Degradation of microcystins in aqueous solution with in situ electrogenerated active chlorine

Application of Ion Implantation to the Study of Electrocatalysis: I . Chlorine Evolution at Ru‐Implanted Titanium Electrodes

Investigation of the electrical properties, charging process, and passivation of RuO2–Ta2O5 oxide films

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