Meet. Abstr.
 2011
DOI: 10.1149/ma2011-01/22/1348
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Clear Difference between the Chemical Structure of SiO2/Si Interface Formed Using Oxygen Radicals and that Formed Using Oxygen Molecules

Tomoyuki Suwa,
Yuki Kumagai,
Akinobu Teramoto
et al.

Abstract: not Available.

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